Browsing by author "Hermans, Jan"
Now showing items 1-20 of 73
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157nm full field imaging
Hermans, Jan; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke; Ronse, Kurt (2003-08) -
32nm node technology development using interference immersion lithography
Sewell, H.; McCafferty, D.; Markoya, L.; Hendrickx, Eric; Hermans, Jan; Ronse, Kurt (2005) -
60 MeV proton irradiation effects on NO-annealed and standard-oxide deep submicron MOSFETs
Simoen, Eddy; Hermans, Jan; Vereecken, Wim; Vermoere, Carl; Claeys, C.; Augendre, Emmanuel; Badenes, Gonçal; Mohammadzadeh, A. (2001) -
A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
de Marneffe, Jean-Francois; Goossens, Danny; Vandervorst, Alain; Demuynck, Steven; Goethals, Mieke; Hermans, Jan; Van Roey, Frieda; Baudemprez, Bart; Brus, Stephan; Vrancken, Christa (2008) -
Accurate models for EUV simulation and their use for design correction
Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Hendrickx, Eric; Klostermann, Ulrich K.; Jang, Stephen; Zavyalova, Lena; Sorensen, Jacob; Gao, Weimin; Lucas, Kevin (2009) -
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Compensation of overlay errors due to mask bending and non-flatness for EUV masks
Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009) -
Contamination monitoring and control on ASML MS-VII 157-nm exposure tool
Okoroanyanwu, Uzo; Gronheid, Roel; Coenen, Jan; Hermans, Jan; Ronse, Kurt (2004) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Dependence of EUV mask printing performance on blank architecture
Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03) -
Design and implementation of advanced sytems on flexible-stretchable technology towards embedding textile
Carta, R.; Jourand, B.; Hermans, Jan; Thoné, J.; Axisa, Fabrice; Vanfleteren, Jan; Puers, Bob (2008-09) -
Direct correlation between mask registration and on-wafer measurements for individual logic device features
van Haren, Richard J. F.; Steinert, Steffen; Mouraille, Orion; Kasperkiewicz, Ewa; Hermans, Jan; Hasan, Mahmudul; van Dijk, Leon; Beyer, Dirk (2022) -
Etch tool pressure optimization enabling wafer edge overlay control.
Yildirim, Oktay; van Haren, Richard; Mouraille, Orion; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Feurprier, Yannick (2020) -
EUV baseline process optimizations for NXE:3100 evaluation
Foubert, Philippe; Shite, Hideo; Nafus, Kathleen; Hermans, Jan; Hendrickx, Eric (2011) -
EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
Goethals, Mieke; Demuynck, Steven; Van Roey, Frieda; Baudemprez, Bart; Hermans, Jan; Huffman, Craig; Lazzarino, Frederic; Pollentier, Ivan; Hendrickx, Eric; Jonckheere, Rik; Verhaegen, Staf; Veloso, Anabela; Vandenberghe, Geert; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010)