Browsing by author "Baik, Ki-Ho"
Now showing items 1-5 of 5
-
Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Gogolides, E.; Baik, Ki-Ho; Yannakopolou, K.; Van den hove, Luc (1994) -
Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Proximity effects in dry developed lithography for sub-0.35 µm application
Goethals, Mieke; Baik, Ki-Ho; Ronse, Kurt; Vertommen, Johan; Van den hove, Luc (1994)