Browsing by author "Jonckx, Franky"
Now showing items 1-7 of 7
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Characterisation of HF-last cleaning of ion-implanted Si surfaces
Kondoh, Eiichi; Baklanov, Mikhaïl; Jonckx, Franky; Maex, Karen (1998) -
Elimination of HF-last cleaning related CoSi2 defects formation
Zou, Gang; Jonckx, Franky; Alves Donaton, Ricardo; Kuper, Werner; Maex, Karen; Mertens, Paul; Meuris, Marc; Heyns, Marc; Locke, Klaus; Korac, M.; Schild, R. (1994) -
Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyond
Wang, Qingfeng; Lauwers, Anne; Jonckx, Franky; de Potter de ten Broeck, Muriel; Chen, Chun-Cho; Maex, Karen (1996) -
New drying techology for advanced cleaning in IC manufacturing
Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M. (1994) -
On the formation of silicides on polyrunners with topography by a two-step silicidation process
Jonckx, Franky; Verbeeck, Rita; Deweerdt, Bruno; Maex, Karen (1995) -
Structural and electrical characterization of FeSix-layers (1 < X < 2) prepared by RTA of Fe layers sputtered on Si (100)
Libezny, Milan; Poortmans, Jef; Amesz, Peter Henk; Alves Donaton, Ricardo; Larsen, Kim Kyllesbech; Vandenabeele, Peter; Jonckx, Franky; Maex, Karen; Nijs, Johan (1995) -
Ti-salicide improvement by preamorphization for ULSI applications
Chen, Chun-Cho; Wang, Qingfeng; Jonckx, Franky; Jenq, Jyh-Shyang; Maex, Karen (1996)