Browsing by author "Biafore, John"
Now showing items 1-15 of 15
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A compact physical CD-SEM simulator for IC photolithography modeling applications
Fang, Chao; Smith, Mark D; Vaglio Pret, Alessandro; Biafore, John; Robertson, Steward A; Bekaert, Joost (2014) -
Characterization of a thermal freeze LLE double patterning process for predictive simulation
Robertson, Stewart; Wong, Patrick; Biafore, John; Vandenbroeck, Nadia; Wiaux, Vincent (2010) -
EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Impact of mask line roughness in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Impact of mask three dimensional effects on resist-model calibration
De Bisschop, Peter; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Biafore, John; Robertson, Stewart A.; Smith, Mark (2009) -
Impact of stochastic effects on EUV printability limits
De Bisschop, Peter; Van de Kerkhove, Jeroen; Mailfert, Julien; Vaglio Pret, Alessandro; Biafore, John (2014) -
Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Wong, Patrick; De Bisschop, Peter; Robertson, Stewart; Vandenbroeck, Nadia; Biafore, John; Wiaux, Vincent; Van de Kerkhove, Jeroen (2011) -
Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent; Van de Kerkhove, Jeroen; Robertson, Stewart; Biafore, John (2012) -
Mask absorber roughness impact in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Mask effects on resist variability in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Engelen, Jan; Yan, Pei-Yang; Leeson, Michael; Younkin, Todd; Garidis, Kostas; Biafore, John (2013) -
Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Winroth, Gustaf; Biafore, John; Anno, Yusuke; Hoshiko, Kenji; Constantoudis, Vassilios (2013) -
Statistical simulation of resist at EUV and ArF
Biafore, John; Smith, Mark; Mack, Chris A.; Thackeray, James; Gronheid, Roel; Robertson, Stewart; Graves, Trey; Blankenship, David (2009) -
Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
Vaglio Pret, Alessandro; De Bisschop, Peter; Smith, Mark; Biafore, John (2014) -
Stochastic effects and resist variability in high resolution lithography
Vaglio Pret, Alessandro; Garidis, K.; Gronheid, Roel; Biafore, John (2012) -
Stochastic limitations for EUV resist kinetics towards the 16nm node
Vaglio Pret, Alessandro; Garidis, Kostas; Gronheid, Roel; Biafore, John (2011)