Browsing by author "Boher, P."

Characterization of high-k dielectrics by combined spectroscopic ellipsometry (SE) and x-ray reflectometry (XRR)

Sun, L.; Defranoux, C.; Stehlé, J.L.; Boher, P.; Evrard, P.; Bellandi, E.; Bender, Hugo (2004)

HfO2, Al2O3 and HfAlOx high-k dielectrics characterized by VUV spectroscopic ellipsometry

Boher, P.; Defranaoux, C.; Bender, Hugo (2003)

High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry

Boher, P.; Evrard, P.; Defranoux, C.; Darragon, A.; Sun, Lianchao; Fouere, J.C.; Stehlé, J.L.; Bellandi, E.; Bender, Hugo (2003-12)

High-k dielectric characterization by VUV spectroscopic ellipsometry and X-ray reflection

Boher, P.; Evrard, P.; Defranoux, C.; Fouere, J.C.; Bellandi, E.; Bender, Hugo (2003)

Physical characterization of mixed HfAlOx layers by complementary analysis techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, E.; Houssiau, L.; Pireaux, J-J.; Bergmaier, A.; Dollinger, G. (2004)

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo; Conard, Thierry; Richard, Olivier; Brijs, Bert; Petry, Jasmine; Vandervorst, Wilfried; Defranoux, C.; Boher, P.; Rochat, N.; Wyon, C.; Mack, P.; Wolstenholme, J.; Vitchev, R.; Houssiau, L.; Pireaux, J.J.; Bergmaier, A.; Dollinger, G. (2003)

Spectroscopic ellipsometry in the VUV range applied to the characterization of atomic layer deposited HfO2,Al2O3 and HfAlOx thin layers for high k dielectrics

Boher, P.; Defranoux, C.; Bourtault, S.; Piel, J.P.; Bender, Hugo (2003)