Browsing by author "Van Steenwinckel, David"
Now showing items 1-11 of 11
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A novel method for characterizing resist performance
Van Steenwinckel, David; Gronheid, Roel; Van Roey, Frieda; Willems, Patrick; Lammers, Jeroen H. (2008) -
A novel method for characterizing resist performance
Van Steenwinckel, David; Gronheid, Roel; Lammers, J.H.; Myers, Alan; Van Roey, Frieda; Willems, Patrick (2007) -
Bio-interface development for CMOS based biosensors
Jans, Karolien; Merelle, Thomas; Dhaenens, Kristof; Lambert, Magali; Wang, Shuo; Van Steenwinckel, David; Lagae, Liesbet (2010) -
Investigation of statistical Fluctuations on line edge rougness
Leunissen, Peter; Patsis, G.P.; Van Steenwinckel, David; Lammers, Jeroen (2005) -
Lithographic importance of acid diffusion in chemically amplified resists
Van Steenwinckel, David; Lammers, Jeroen; Leunissen, Peter; Kwinten, Hans (2005) -
Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
Van Steenwinckel, David; Kwinten, Hans; Locorotondo, Sabrina; Beckx, Stephan (2004) -
Performance assessment of novel resist approaches for EUV lithography using a single figure of merit
Van Steenwinckel, David; Gronheid, Roel; Van Roey, Frieda (2007) -
Resist evaluation using EUV interference lithography
Gronheid, Roel; Van Roey, Frieda; Goethals, Mieke; Leunissen, Peter; Van Steenwinckel, David; Solak, H.H. (2004) -
Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography
Gronheid, Roel; Van Steenwinckel, David (2008) -
Resolution, line width roughness and sensitivity in advanced photoresists
Van Steenwinckel, David; Gronheid, Roel; Lammers, J.H. (2008) -
Using KLUP for understanding trends in EUV resist performance
Gronheid, Roel; Van Roey, Frieda; Van Steenwinckel, David (2008)