Browsing by author "van Haren, Richard"
Now showing items 1-13 of 13
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Characterisation of direct alignment for LFLE process
Laidler, David; Leray, Philippe; Cheng, Shaunee; Doytcheva, Maya; Tenner, Manfred; van Haren, Richard (2009) -
Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance
Gorhad, Kujan; Sharon, Ofir; Dmitriev, Vladimir; Cohen, Avi; van Haren, Richard; Roelofs, Christian; Cekli, H.E.; Gallagher, Emily; Leray, Philippe; Beyer, Dirk; Trautsch, Thomas; Steinert, Steffen (2016) -
Etch tool pressure optimization enabling wafer edge overlay control.
Yildirim, Oktay; van Haren, Richard; Mouraille, Orion; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Feurprier, Yannick (2020) -
Intra-field etch induced overlay penalties
van Haren, Richard; Yildirim, Oktay; Mouraille, Orion; van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2020) -
Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Otten, Ronald; Beyer, Dirk (2018) -
Intra-field stress impact on global wafer deformation
van Haren, Richard; Otten, Ronald; Singh, Subodh; Singh, Amandev; Van Dijk, Leon; Owen, David; Anberg, Doug; Mileham, Jeffrey; Gu, Yajun; Hermans, Jan (2019) -
Off-line mask-to-mask registration characterization
van Haren, Richard; Steinert, Steffen; Roelofs, Christian; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Beyer, Dirk (2017) -
On product overlay characterization after stressed layer etch
van Haren, Richard; Mouraille, Orion; Yildirim, Oktay; Van Dijk, Leon; Kumar, Kaushik; Feurprier, Yannick; Hermans, Jan (2021) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The mask contribution as part of the intra-field on-product overlay performance
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; Hermans, Jan; van Dijk, Leon; Beyer, Dirk; Yildirim, Oktay (2020) -
Wafer alignment mark placement accuracy impact on the layer to layer overlay performance
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
Wafer shape based in-plane distortion predictions using superfast 4G metrology
Van Dijk, Leon; Mileham, Jeffrey; Malakhovsky, Ilja; Laidler, David; Dekkers, Harold; Van Elshocht, Sven; Anberg, Doug; Owen, David M.; van Haren, Richard (2017)