Browsing by author "Besling, W."
Now showing items 1-7 of 7
-
Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films
Zhao, Chao; Brijs, Bert; Dortu, Fabian; De Gendt, Stefan; Caymax, Matty; Heyns, Marc; Besling, W.; Maes, Jan (2003) -
Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
Martin Hoyas, Ana; Schuhmacher, Jorg; Shamiryan, Denis; Waeterloos, Joost; Besling, W.; Celis, Jean-Pierre; Maex, Karen (2004) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour deposition
De Witte, Hilde; Maes, Jan; Passefort, S.; Besling, W.; Eason, K.; Young, E.; Rittersma, Chris; Heyns, Marc (2002-09) -
Integration of ALD WCN into a dual damascene oxide module
Schuhmacher, Jörg; Beyer, Gerald; Vos, Ingrid; Sutcliffe, Victor; Tokei, Zsolt; Besling, W.; Maex, Karen (2003) -
Nucleation and growth of TiN films deposited by atomic layer deposition
Satta, Alessandra; Brongersma, Sywert; Schuhmacher, Jörg; Conard, Thierry; Beyer, Gerald; Maex, Karen; Viitanen, M.M.; Brongersma, H.H.; Besling, W.; Kilpela, Olli; Sprey, Hessel; Vantomme, Andre (2002) -
Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
Abell, Thomas; Shamiryan, Denis; Schuhmacher, Jörg; Besling, W.; Sutcliffe, V.; Maex, Karen (2003) -
TOF-SIMS as a rapid diagnostic tool to monitor the growth mode of thin (high k) films
Conard, Thierry; Vandervorst, Wilfried; Petry, Jasmine; Zhao, Chao; Besling, W.; Nohira, Hiroshi; Richard, Olivier (2003)