Browsing by author "Vleeming, Bert"
Now showing items 1-13 of 13
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Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node
Vleeming, Bert; Heskamp, B.; Finders, Jo; Jaenen, Patrick (2000) -
ArF lithography options for 100-nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
ArF lithography options for 100nm technologies
Vandenberghe, Geert; Kim, Young-Chang; Delvaux, Christie; Lucas, Kevin; Choi, Sang-Jun; Ercken, Monique; Ronse, Kurt; Vleeming, Bert (2001) -
Critical assessment of error budget components in double patterning immersion lithography
Hepp, Birgitt; Finders, Jo; Dusa, Mircea; Vleeming, Bert; Megens, henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Fliervoet, Timon; Hepp, Birgitt; Megens, henry; Groenendijk, Remco; Quaedackers, John; Mos, Evert; Leewis, Christian; Bornebroek, Frank; Maenhoudt, Mireille; Leblans, Marc; Vandeweyer, Tom; Murdoch, Gayle; Altamirano Sanchez, Efrain (2009) -
Double patterning for 32-nm and below: an update
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Megens, Henry; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2008) -
Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Finders, Jo; Dusa, Mircea; Vleeming, Bert; Hepp, Birgitt; Maenhoudt, Mireille; Cheng, Shaunee; Vandeweyer, Tom (2009) -
Introducing 193 nm lithography
Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998) -
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Dusa, Mircea; Quaedackers, John; Larsen, Olaf F.A.; Meessen, J.; van der Heijden, Eddy; Dicker, Gerald; Wismans, Onno; de Haas, Paul; van Ingen Schenau, Koen; Finders, Jo; Vleeming, Bert; Storms, Greet; Jaenen, Patrick; Cheng, Shaunee; Maenhoudt, Mireille (2007) -
Process optimization for sub-100-nm gate patterns using phase edge lithography
van Ingen Schenau, K.; Vleeming, Bert; Gehoel-van Ansem, W. F.; Wong, P.; Vandenberghe, Geert (2001) -
Spacer self aligned double patterning: process control
Vandeweyer, Tom; Altamirano Sanchez, Efrain; Vangoidsenhoven, Diziana; Murdoch, Gayle; Groenendijk, Remco; Hepp, Birgitt; Mos, Evert; Finders, Jo; Vleeming, Bert; Dusa, Mircea; Maenhoudt, Mireille (2009) -
Status of ArF lithography for the 130nm technology node
Ronse, Kurt; Vandenberghe, Geert; Jaenen, Patrick; Delvaux, Christie; Vangoidsenhoven, Diziana; Van Roey, Frieda; Pollers, Ingrid; Maenhoudt, Mireille; Goethals, Mieke; Pollentier, Ivan; Vleeming, Bert; van Ingen Schenau, K.; Heskamp, B.; Davies, G.; Finders, Jo; Niroomand, Ardavan (2000) -
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Vleeming, Bert; Maenhoudt, Mireille; Quaedackers, John; van der Heijden, Eddy; de Haas, Paul; Uzunbajakau, Siarhei; Meessen, Jeroen; Dicker, Gerald; Finders, Jo; Dusa, Mircea; Jaenen, Patrick; Locorotondo, Sabrina (2007)