Browsing by author "Isawa, Miki"
Now showing items 1-8 of 8
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Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Ishimoto, Toru; Isawa, Miki; Tanaka, Maki; Cheng, Shaunee (2011) -
Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
In-line Metrology for Vertical Edge Placement Control of Monolithic CFET using CD-SEM
Sun, Wei; Doi, Ayumi; Isawa, Miki; Vega Gonzalez, Victor; Tokei, Zsolt; Lorusso, Gian (2023) -
Line edge roughness measurement technique of fingerprint in block copolymer thin film
Isawa, Miki; Sakai, Kei; Rincon Delgadillo, Paulina; Gronheid, Roel; Yoshida, Hiroshi (2013) -
MuGFET Observation and CD measurement by using CD-SEM
Maeda, Tatsuya; Tanaka, Maki; Isawa, Miki; Watanabe, Kenji; Hasegawa, Norio; Sekiguchi, Kohei; Rooyackers, Rita; Collaert, Nadine; Vandeweyer, Tom (2008-02) -
Validation of CD-SEM etching residue evaluation technique for MuGFET structures
Isawa, Miki; Tanaka, Maki; Maeda, Tatsuya; Watanabe, Kenji; Vandeweyer, Tom; Collaert, Nadine; Rooyackers, Rita (2009) -
Verification and extension of the MBL technique for photoresist pattern shape measurement
Isawa, Miki; Tanaka, Maki; Kazumi, Hideyuki; Shishido, Chie; Hamamatsu, Akira; Hasegawa, Norio; De Bisschop, Peter; Laidler, David; Leray, Philippe; Cheng, Shaunee (2011)