Browsing by author "Grozev, Grozdan"
Now showing items 1-10 of 10
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100-nm generation contact patterning by low temperature 193-nm resist reflow process
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2002) -
Experimental characterization of NTD rResist shrinkage
Kuchler, Bernd; Mulders, Thomas; Taoka, Hironobu; Gao, Weimin; Klostermann, Ulrich; Kamimura, Sou; Grozev, Grozdan; Masahiro, Yoshidome; Shirakawa, Michihiro; Li, Waikin (2017) -
Increasing DOF for VIA lithography using a non-CMP based architecture
Grozev, Grozdan; Waeterloos, Joost; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen (1997) -
Intra-wafer CD-control in state-of-the-art lithography
Pollentier, Ivan; Baerts, Christina; Marschner, Thomas; Ronse, Kurt; Grozev, Grozdan; Reybrouck, Mario (1999) -
Low-temperature 193nm resist reflow process for 100 nm generation contact patterning
Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2001) -
Optically enhanced i-line lithography for 0.3-μm random logic applications
Yen, Anthony; Tzviatkov, Plamen; Grozev, Grozdan (1996) -
Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
Patsis, G.P.; Constantoudis, V.; Tserepi, A.; Gogolides, E.; Grozev, Grozdan (2003) -
Resist reflow for 193-nm low-K1 lithography contacts
Montgomery, P.K.; Lucas, K.; Strozewski, K.J.; Zavyalova, L.; Grozev, Grozdan; Reybrouck, Mario; Tzviatkov, P.; Maenhoudt, Mireille (2003) -
Resolving line collapse in 193nm lithography with surfactinated post develop rinse solutions
Versluijs, Janko; Misat, Sylvain Irénée; Maenhoudt, Mireille; Grozev, Grozdan; Furusho, Tetsunari (2003) -
Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
Patsis, G.P.; Constantoudis, V.; Tserepi, A.; Gogolides, E.; Grozev, Grozdan; Hoffmann, Thomas (2003)