Browsing by author "Sekiguchi, Kohei"
Now showing items 1-6 of 6
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A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Ishimoto, Toru; Sekiguchi, Kohei; Hasegawa, Norio; Watanabe, Kenji; Laidler, David; Cheng, Shaunee (2009) -
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Further study on the verification of CD-SEM based monitoring for hyper NA lithography
Ishimoto, Toru; Osaki, M.; Sekiguchi, Kohei; Hasegawa, N.; Watanabe, K.; Laidler, David; Cheng, Shaunee (2008) -
MuGFET Observation and CD measurement by using CD-SEM
Maeda, Tatsuya; Tanaka, Maki; Isawa, Miki; Watanabe, Kenji; Hasegawa, Norio; Sekiguchi, Kohei; Rooyackers, Rita; Collaert, Nadine; Vandeweyer, Tom (2008-02) -
Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Ishimoto, Toru; Sekiguchi, Kohei (2010)