Browsing by author "Scheer, Steven"
Now showing items 1-15 of 15
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A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
Addressing the challenges of Directed Self Assembly implementation
Gronheid, Roel; Pollentier, Ivan; Younkin, Todd; Somervell, Mark; Nafus, Kathleen; Hooge, Josh; Rathsack, Ben; Scheer, Steven; Rincon Delgadillo, Paulina; Nealy, Paul (2011) -
Advances and challenges in dual-tone development process optimization
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Printz, Wallace; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Niwa, Takafumi; Bernard, Sophie; Gronheid, Roel (2009) -
Advances in dual-tone development for pitch frequency doubling
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Kuwahara, Yuhei; Nafus, Kathleen; Gronheid, Roel; Tarutani, Shinji; Enomoto, Yuuchiro (2010) -
Advances in process optimization for dual-tone development as a double patterning technique
Fonseca, Carlos; Somervell, Mark; Bernard, Sophie; Hatakeyama, Shinichi; Nafus, Kathleen; Leeson, Michael; Scheer, Steven; Gronheid, Roel (2008) -
Comparison of directed self-assembly integrations
Somervell, Mark; Gronheid, Roel; Hooge, Joshua; Nafus, Kathleen; Rincon Delgadillo, Paulina; Thode, Chris; Younkin, Todd; Matsunaga, Koichi; Rathsack, Ben; Scheer, Steven; Nealy, Paul (2012) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
Extraction and identification of resist modeling parameters for EUV lithography
Fonseca, Carlos; Gronheid, Roel; Scheer, Steven (2008) -
Feasibility study on dual tone development for frequency doubling
Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008) -
Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Rathsack, Ben; Scheer, Steven; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Baerts, Christina (2008) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011) -
Understanding and improving double patterning CDU through Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Kubo, Akihiro; Kondo, Yoshihiro; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Leray, Philippe; Cheng, Shaunee (2008) -
World-wide standardization effort on leaching measurement methodology
Gronheid, Roel; Baerts, Christina; Caporalo, Stefan; Alexander, Jim; Rathsack, Ben; Scheer, Steven; Ohmori, Katsumi; Rice, Bryan (2007)