Browsing by author "Ablett, James"
Now showing items 1-7 of 7
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Characterization of chemically vapor deposited manganese barrier layers using X-ray absorption fine structure
Ablett, James; Wilson, Chris; Phuong, Nguyen Mai; Koike, Junichi; Tokei, Zsolt; Sterbinsky, George; Woicik, Joseph (2012) -
Characterization of CVD-Mn barrier layers using X-ray absorption fine structure
Ablett, James; Wilson, Chris; Phuong, Nguyen Mai; Koike, Junichi; Tokei, Zsolt; Sterbinsky, George; Woicik, Joseph (2011) -
Interface passivation of III-V/high-k materials by High Energy X-ray Photoelectron Spectroscopy: A quantitative evaluation
Conard, Thierry; Spampinato, Valentina; Nyns, Laura; Sioncke, Sonja; Ablett, James; Vandervorst, Wilfried (2016) -
Interpretation of Cu/SOG stress induced voiding using stress measurements performed with synchrotron radiation
Wilson, Chris; Croes, Kristof; Ablett, James; Lofrano, Melina; Beyer, Gerald; Tokei, Zsolt (2011) -
Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control
Peter, Antony; Martens, Koen; Rampelberg, Geert; Toeller, Michael; Ablett, James; Meersschaut, Johan; Cuypers, Daniel; Franquet, Alexis; Detavernier, Christophe; Reuff, Jean-Pascal; Schaekers, Marc; Van Elshocht, Sven; Jurczak, Gosia; Adelmann, Christoph; Radu, Iuliana (2015) -
Phase identification of self-forming Cu-Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structures
Ablett, James; Woicik, Joseph; Tokei, Zsolt; List, Scott; Dimasi, Elaine (2009) -
Study of deposition behavior of thermal/plasma-enhanced chemical vapor deposition (CVD/PECVD) of manganese on porous SiCOH low-k dielectric materials for copper diffusion barrier application in advanced interconnect technology
Jourdan, Nicolas; Baklanov, Mikhaïl; Meersschaut, Johan; Vereecke, Guy; Conard, Thierry; Wilson, Chris; Ablett, James; Fonda, Emiliano; Geypen, Jef; Siew, Yong Kong; Van Elshocht, Sven; Tokei, Zsolt (2012)