Browsing by author "Gray, William"
Now showing items 1-7 of 7
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A comparative study of copper drift diffusion in plasma deposited a-SiC : H and Silicon Nitride
Lanckmans, Filip; Gray, William; Brijs, Bert; Maex, Karen (2001) -
A comparative study of copper drift diffusion in plasma deposited A-Sic:H and silicon nitride
Lanckmans, Filip; Gray, William; Brijs, Bert; Maex, Karen (2000) -
Integration of the 3MS low-k CVD material in a 0.18 μm Cu single damascene process
Gao, Teng; Gray, William; Van Hove, Marleen; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge; Maex, Karen (2000) -
Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process
Gao, Teng; Gray, William; Van Hove, Marleen; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge (1999) -
Low-k materials etch and strip optimization for sub 0.25µm technology
Gao, Teng; Gray, William; Van Hove, Marleen; Rosseel, Erik; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films
Alves Donaton, Ricardo; Iacopi, Francesca; Baklanov, Mikhaïl; Shamiryan, Denis; Coenegrachts, Bart; Struyf, Herbert; Lepage, Muriel; Meuris, Marc; Van Hove, Marleen; Gray, William; Meynen, Herman; De Roest, David; Vanhaelemeersch, Serge; Maex, Karen (2000) -
Process optimization and integration of trimethylsilane deposited a-SiC:H and SiOC:H dielectric thin films for damascene processing
Gray, William; Loboda, M.; Struyf, Herbert; Van Hove, Marleen; Donaton, R. A.; Sleeckx, Erik; Stucchi, Michele; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, Herman; Maex, Karen (2000)