Browsing by author "Fonseca, Carlos"
Now showing items 1-11 of 11
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Advances and challenges in dual-tone development process optimization
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Printz, Wallace; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Niwa, Takafumi; Bernard, Sophie; Gronheid, Roel (2009) -
Advances in dual-tone development for pitch frequency doubling
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Kuwahara, Yuhei; Nafus, Kathleen; Gronheid, Roel; Tarutani, Shinji; Enomoto, Yuuchiro (2010) -
Advances in process optimization for dual-tone development as a double patterning technique
Fonseca, Carlos; Somervell, Mark; Bernard, Sophie; Hatakeyama, Shinichi; Nafus, Kathleen; Leeson, Michael; Scheer, Steven; Gronheid, Roel (2008) -
EUV resist requirements: absorbance and acid yield
Gronheid, Roel; Fonseca, Carlos; Leeson, Michael; Adams, Jacob; Strahan, Jeff; Willson, C. Grant; Smith, Bruce W. (2009) -
EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Exploration of new resist chemistries and process methods for enabling dual-tone development
Fonseca, Carlos; Somervell, M.; Scheer, S.; Kuwahara, Y.; Nafus, Kathleen; Gronheid, Roel; Tarutani, S. (2009) -
Extraction and identification of resist modeling parameters for EUV lithography
Fonseca, Carlos; Gronheid, Roel; Scheer, Steven (2008) -
Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D. (2011) -
Feasibility study on dual tone development for frequency doubling
Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008) -
Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Fonseca, Carlos; Head, Brian H.; Shite, Hideo; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf (2011) -
Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution
Fonseca, Carlos; Shite, Hideo; Head, Brian; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf (2010)