Browsing by author "Noda, Taiji"
Now showing items 1-10 of 10
-
Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Noda, Taiji; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Cuperus, Aldert; Mcintosh, R.; Vrancken, Christa; Rosseel, Erik; Bender, Hugo; Van Daele, Benny; Niwa, Masaaki; Umimoto, H.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2007) -
Analysis of dopant diffusion and defects in fin structure using an atoministic kinetic Monte Carlo approach
Noda, Taiji; Kambham, Ajay; Vrancken, Christa; Thean, Aaron; Horiguchi, Naoto; Vandervorst, Wilfried (2013) -
Analysis of dopant diffusion and defects in SiGe-channel implant free quantum well (IFQW) devices using an atomistic kinetic Monte Carlo approach
Noda, Taiji; Mitard, Jerome; Witters, Liesbeth; Hellings, Geert; Vrancken, Christa; Eyben, Pierre; Thean, Aaron; Horiguchi, Naoto; Vandervorst, Wilfried (2012) -
Atomistic modeling of pocket dopant deactivation and its impact on Vth variation in scaled Si planar devices using an atomistic kinetic Monte Carlo approach
Noda, Taiji; Vrancken, Christa; Vandervorst, Wilfried; Horiguchi, Naoto (2015) -
Junction strategies for 1x nm technology node with FINFET and high mobility channel
Horiguchi, Naoto; Zschaetzsch, Gerd; Sasaki, Yuichiro; Kambham, Ajay Kumar; Douhard, Bastien; Togo, Mitsuhiro; Hellings, Geert; Mitard, Jerome; Witters, Liesbeth; Eneman, Geert; Noda, Taiji; Collaert, Nadine; Vandervorst, Wilfried; Thean, Aaron (2012) -
Kinetic Monte Carlo simulations for dopant diffusion and defects in Si and SiGe
Horiguchi, Naoto; Noda, Taiji; Witters, Liesbeth; Mitard, Jerome; Rosseel, Erik; Hellings, Geert; Vrancken, Christa; Eyben, Pierre; Bender, Hugo; Thean, Aaron; Vandervorst, Wilfried (2013) -
Laser annealed junctions: pocket profile analysis using an atomistic kinetic Monte Carlo approach
Noda, Taiji; Ortolland, Claude; Vandervorst, Wilfried; Vrancken, Christa; Rosseel, Erik; Clarysse, Trudo; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010) -
Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies
Hoffmann, Thomas Y.; Noda, Taiji; Felch, S.; Severi, Simone; Parihar, V.; Forstner, H.; Vrancken, Christa; de Potter de ten Broeck, Muriel; Van Daele, Benny; Bender, Hugo; Niwa, Masaaki; Schreutelkamp, Rob; Vandervorst, Wilfried; Biesemans, Serge; Absil, Philippe (2007) -
Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Ultra-shallow junctions formed by C co-implantation with spkie plus sub-melt laser annealing
Felch, S.B.; Collart, E.; Parihar, V.; Thirupapulyur, S.; Schreutelkamp, R.; Pawlak, Bartek; Hoffmann, Thomas Y.; Severi, Simone; Eyben, Pierre; Vandervorst, Wilfried; Noda, Taiji (2008)