Browsing by author "Granik, Yuri"
Now showing items 1-7 of 7
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Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Fenger, Germain; Burbine, Andrew; Torres, J. Andres; Ma, Yuansheng; Granik, Yuri; Krasnova, Polina; Vandenberghe, Geert; Gronheid, Roel; Bekaert, Joost (2014) -
Contour-based self-aligning calibration of OPC models
Kusnadi, Ir; Do, Thuy; Granik, Yuri; Sturtevant, John L.; De Bisschop, Peter; Hibino, Daisuke (2010) -
Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Granik, Yuri; Kempsell, Monica; Vandenberghe, Geert (2008) -
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Kempsell, Monica; Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Yasui, Kenichi; Yoshitake, Susuki; Granik, Yuri; Vandenberghe, Geert; Smith, Bruce W. (2009) -
Physically-based compact models for fast lithography simulation
Lafferty, Neal; Adam, Kostas; Granik, Yuri; Torres, Andres; Maurer, Wilhelm (2005) -
Validation of improved compact model in grapho-epitaxy Directed-Self-Assembly (DSA)
Fenger, Germain; Bekaert, Joost; Torres, Andres; Granik, Yuri; Krasnova, Polina; Doise, Jan; Boeckx, Carolien; Vandenberghe, Geert; Gronheid, Roel (2015)