Browsing by author "Garaud, Sylvain"
Now showing items 1-10 of 10
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Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007) -
Galvanic corrosion of stacked metal gate electrodes during cleaning in HF solutions
Garaud, Sylvain; Vos, Rita; Shamiryan, Denis; Paraschiv, Vasile; Mertens, Paul; Fransaer, Jan; De Gendt, Stefan (2008) -
Impact of galvanic corrosion on metal gate stacks
Wada, Masayuki; Garaud, Sylvain; Ferain, Isabelle; Collaert, Nadine; Sano, Ken-Ichi; Snow, Jim; Vos, Rita; Leunissen, Peter; Mertens, Paul; Eitoku, A (2008) -
Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study
Deweerd, Wim; Schram, Tom; Catana, Gabriela; Shamiryan, Denis; Garaud, Sylvain; Hellin, David; De Gendt, Stefan; Heyns, Marc; Wickramanayaka, S.; Kawashima, T.; Yamada, N.; Vertommen, Johan; Lander, Rob (2004) -
Materials characterization of WNxCy, WNx and WCx films for advanced barriers
Volders, Henny; Tokei, Zsolt; Bender, Hugo; Brijs, Bert; Caluwaerts, Rudy; Carbonell, Laure; Conard, Thierry; Drijbooms, Chris; Franquet, Alexis; Garaud, Sylvain; Hoflijk, Ilse; Li, Wei-Min; Moussa, Alain; Sinapi, Fabrice; Sprey, Hessel; Travaly, Youssef; Vanhaeren, Danielle; Vereecke, Guy (2007) -
Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
Claes, Martine; Paraschiv, Vasile; Beckx, Stephan; Demand, Marc; Deweerd, Wim; Garaud, Sylvain; Kraus, Harald; Vos, Rita; Snow, Jim; Boullart, Werner; De Gendt, Stefan (2004) -
Selective wet removal of Hf-based layers and post-dry etch residues in high-k and metal gate stacks
Claes, Martine; Paraschiv, Vasile; Beckx, Stephan; Demand, Marc; Deweerd, Wim; Garaud, Sylvain; Kraus, Harald; Vos, Rita; Snow, Jim; Boullart, Werner; De Gendt, Stefan (2005) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2004) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2005)