Browsing by imec author "b2ac8dace7a45b7a6af95ef28ce10ba887eb0f76"
Now showing items 1-20 of 46
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A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12) -
A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Ishimoto, Toru; Sekiguchi, Kohei; Hasegawa, Norio; Watanabe, Kenji; Laidler, David; Cheng, Shaunee (2009) -
A single metrology tool solution for complete exposure tool setup
Laidler, David; D'have, Koen; Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Vanoppen, Peter; Hinnen, Paul (2010) -
Achieving optimum diffraction based overlay performance
Leray, Philippe; Laidler, David; Cheng, Shaunee; Coogans, Martyn; Fuchs, Andreas; Ponomarenko, Mariya; van der Schaar, Maurits; Vanoppen, Peter (2010) -
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Advanced process control for hyper-NA lithography based on CD-SEM measurement
Ishimoto, Toru; Sekiguchi, K.; Hasegawa, N.; Maeda, T.; Watanabe, K.; Storms, Greet; Laidler, David; Cheng, Shaunee (2007) -
Advances in process overlay
Hinnen, P. C.; Megens, H. J.; van der Schaar, M.; van Haren, R. J.; Mos, E. C.; Lalbahadoersing, S.; Bornebroek, F.; Laidler, David (2001) -
Advances in process overlay: ATHENA alignment system performance on critical proces layers
Laidler, David; Megens, Henri; Lalbahadoersing, Sanjay; Van Haren, Richard J.; Bornebroek, Frank (2002) -
Alignment and overlay
Laidler, David; Gallatin, Gregg M. (2020) -
Characterisation of direct alignment for LFLE process
Laidler, David; Leray, Philippe; Cheng, Shaunee; Doytcheva, Maya; Tenner, Manfred; van Haren, Richard (2009) -
Characterization of overlay mark fidelity
Adel, M.; Ghinovker, M.; Poplawski, J.M.; Kassel, E.; Izikson, P.; Pollentier, Ivan; Leray, Philippe; Laidler, David (2003) -
Cluster optimization to improve total CD control as an enabler for double patterning
Laidler, David; D'have, Koen; Rosslee, Craig; Tedeschi, Len (2008) -
Cluster optimization to improve total CD control as an enabler for double patterning
Tedeschi, Len; Rosslee, C.; Laidler, David; Leray, Philippe; D'have, Koen (2008) -
Comparison of ATHENA and TTL alignment capability in product wafers
Opitz, Juliann; Laidler, David (2002) -
Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
D'have, Koen; Machida, Takahiro; Laidler, David; Cheng, Shaunee (2007) -
Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures
Leray, Philippe; Laidler, David; Pollentier, Ivan (2003) -
Diffraction based overlay re-assessed
Leray, Philippe; Laidler, David; D'have, Koen; Cheng, Shaunee (2011) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
Focus and dose de-convolution technique for improved CD-control of immersion clusters
Charley, Anne-Laure; D'have, Koen; Leray, Philippe; Laidler, David; Cheng, Shaunee; Dusa, Mircea; Hinnen, Paul; Vanoppen, Peter (2010) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008)