Browsing by author "Vasilieva, A.N."

Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma

Baklanov, Mikhaïl; Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Mankelevich, Y.A.; Rakhimova, T.V.; Malykhin, E.M.; Proshina, O.V.; Rakhimov, A.T.; Vasilieva, A.N.; Voloshin, D.G.; Zyryanov, S.M. (2009)

Recombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2009)

Recombination probabilities of O and H atoms on the surface of nanoporous Low-k SiCOH dielectrics

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2008)

Spatially resolved dynamics of methyl groups removal from SiOCH films by oxygen atoms. Monte-Carlo model of O atoms behavior in nanoporous material

Mankelevivh, Yu.A.; Braginsky, O.V; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M; Baklanov, Mikhaïl (2010)

The effect of He plasma treatment on properties of organosilicate glass low-k films

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Proshina, O.V.; Rakhimova, T.V.; Rakhimov, A.T.; Voloshin, D.G.; Vasilieva, A.N.; Zyryanov, S.M.; Smirnov, Evgeny; Baklanov, Mikhaïl (2011)

The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2009)

The mechanism of low-k SiOCH film modification by oxygen atoms

Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2010)