Browsing by author "Kraus, Harald"
Now showing items 1-20 of 25
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A study in interactions of plasmas and wet cleans with ULK materials
Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Kraus, Harald; Henry, Sally - Ann; Archer, L.; Gaulhofer, E.; Kovacs, F.; Dalmer, M.; Mertens, Paul; Luo, S. J; Han, Q. Y (2007) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Cleaning of metal gate stacks for the sub 90nm technology node
Snow, Jim; Kraus, Harald; Vermeyen, Kenneth; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2004) -
Cleaning of metal gate stacks for the sub 90nm technology node
Kraus, Harald; Vermeyen, Kenneth; Snow, Jim; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2003) -
Drying of hydrophobic surfaces - one of the keys for future technologies
Kraus, Harald; Snow, Jim; Mertens, Paul; Holsteyns, Frank; Kenis, Karine; Kovacs, F.; Fichtl, S. (2004) -
Etching and cleaning of HfO2 deposited on Si
Snow, Jim; Kraus, Harald; Van Doorne, Patrick; Mertens, Paul; Kovacs, Fredi (2002-11) -
Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Mertens, Paul; Kovacs, F. (2003) -
Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Röhr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2003) -
Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
De Gendt, Stefan; Beckx, Stephan; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Hellin, David; Kraus, Harald; Onsia, Bart; Paraschiv, Vasile; Puurunen, Riikka; Rohr, Erika; Snow, Jim; Tsai, Wilman; Van Doorne, Patrick; Van Elshocht, Sven; Vertommen, Johan; Witters, Thomas; Heyns, Marc (2004) -
Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Fyen, Wim; Mertens, Paul; Kovacs, Frederic (2004) -
Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Kraus, Harald; Snow, Jim; Van Doorne, Patrick; Mertens, Paul; Kovacs, Frederic (2003) -
Modifications of porous low-k by plasma treatments and wet cleans
Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Henry, Sally-Ann; Kraus, Harald; Archer, L.; Mertens, Paul; Kovacs, F; Dalmer, M; Gaulhofer, E; Luo, S.J.; Han, Q.Y.; Berry, I. (2007) -
Post salicidation clean: selective removal of un-reacted NiPt towards NiPtSi(Ge)
Xu, Kaidong; Lauwers, Anne; Vos, Rita; Archer, L.; Kraus, Harald; Demeurisse, Caroline; Mertens, Sofie; Mertens, Paul; Henry, Sally-Ann; Gale, G.; Kovacs, F; Dalmer, M.; Gaulhofer, E (2007) -
Removing metal gate process residues
Snow, Jim; Fyen, Wim; Mertens, Paul; Kraus, Harald; Kovacs, F.; Vermeyen, K. (2004) -
Rinsing and drying issues during the post CMP cleaning process
Fyen, Wim; Xu, Kaidong; Van Steenbergen, Jan; Vereecke, Guy; Vos, Rita; Arnauts, Sophia; Rip, Jens; Kenis, Karine; Holsteyns, Frank; Hellin, David; Doumen, Geert; Mertens, Paul; Kraus, Harald; Lee, Kim (2004) -
Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitectures
Snow, Jim; Vos, Rita; Kottantharayil, Anil; Kraus, Harald; Xu, Kaidong; Grinninger, F.; Wagner, G.; Kovacs, F.; Mertens, Paul (2005) -
Selective single-wafer wet etching of Hf-based layers
Snow, Jim; Kraus, Harald; Kovacs, Fredi; Claes, Martine; Paraschiv, Vasile; Vos, Rita; Mertens, Paul; De Gendt, Stefan; Heyns, Marc; Archer, Leo (2005) -
Selective wet etching of Hf-based layers
Snow, Jim; Claes, Martine; Paraschiv, Vasile; Kraus, Harald; Eitoku, Atsuro; Vos, Rita; Mertens, Paul; Boullart, Werner; De Gendt, Stefan; Heyns, Marc (2004) -
Selective wet etching of Hf-based layers on a single-wafer spin processor
Kraus, Harald; Kovacs, F.; Snow, Jim; Claes, Martine; Paraschiv, Vasile; Vos, Rita; Mertens, Paul; De Gendt, Stefan; Heyns, Marc (2004) -
Selective wet etching of nickel
Snow, Jim; Kraus, Harald; Fano Leston, Vanessa; Xu, Kaidong; Mertens, Paul; Kovacs, Fredi (2005-04)