Browsing by author "Kondoh, Eiichi"
Now showing items 21-28 of 28
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Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies
Lauwers, Anne; Besser, Paul; de Potter de ten Broeck, Muriel; Kondoh, Eiichi; Roelandts, Nico; Steegen, An; Stucchi, Michele; Maex, Karen (1998) -
Process integration induced thermodesorption from SiO2/SiLK resin dielectric based interconnects
Baklanov, Mikhaïl; Muroyama, M.; Judelewicz, Moshe; Kondoh, Eiichi; Li, H.; Waeterloos, Joost; Vanhaelemeersch, Serge; Maex, Karen (1999) -
Self-aligned CoSi2 for 0.18mm and below
Maex, Karen; Lauwers, A.; Besser, Paul; Kondoh, Eiichi; de Potter de ten Broeck, Muriel; Steegen, An (1999) -
Structural change in porous silica thin film after plasma treatment
Kondoh, Eiichi; Baklanov, Mikhaïl; Bender, Hugo; Maex, Karen (1998) -
The control and impact of processing ambient during RTP
Maex, Karen; Kondoh, Eiichi; Lauwers, Anne; de Potter de ten Broeck, Muriel; Proost, Joris (1998) -
Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry
Vereecke, Guy; Kondoh, Eiichi; Richardson, Paul; Maex, Karen; Heyns, Marc (2000) -
X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the cobalt/SiO2 interface
Conard, Thierry; Kondoh, Eiichi; De Witte, Hilde; Maex, Karen; Vandervorst, Wilfried (1999) -
XPS study of the role of Ti and TiN caps on the Cobalt/SiO2 interface
Conard, Thierry; Kondoh, Eiichi; Vandervorst, Wilfried; Maex, Karen (1998)