Browsing by author "Tanaka, Maki"
Now showing items 1-8 of 8
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Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Ishimoto, Toru; Hasegawa, Norio; Sekiguchi, Kohei; Watanabe, Kenji; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2008) -
Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Yasui, Naoki; Isawa, Miki; Ishimoto, Toru; Sekiguchi, Kohei; Tanaka, Maki; Osaki, Mayuka; Shishido, Chie; Hasegawa, Norio; Cheng, Shaunee (2010) -
Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Ishimoto, Toru; Isawa, Miki; Tanaka, Maki; Cheng, Shaunee (2011) -
MuGFET Observation and CD measurement by using CD-SEM
Maeda, Tatsuya; Tanaka, Maki; Isawa, Miki; Watanabe, Kenji; Hasegawa, Norio; Sekiguchi, Kohei; Rooyackers, Rita; Collaert, Nadine; Vandeweyer, Tom (2008-02) -
Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2009) -
Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
Ishimoto, Toru; Yasui, Naoki; Hasegawa, Norio; Tanaka, Maki; Cheng, Shaunee (2010) -
Validation of CD-SEM etching residue evaluation technique for MuGFET structures
Isawa, Miki; Tanaka, Maki; Maeda, Tatsuya; Watanabe, Kenji; Vandeweyer, Tom; Collaert, Nadine; Rooyackers, Rita (2009) -
Verification and extension of the MBL technique for photoresist pattern shape measurement
Isawa, Miki; Tanaka, Maki; Kazumi, Hideyuki; Shishido, Chie; Hamamatsu, Akira; Hasegawa, Norio; De Bisschop, Peter; Laidler, David; Leray, Philippe; Cheng, Shaunee (2011)