Browsing by author "Eitoku, Atsuro"
Now showing items 1-13 of 13
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Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, K.; Wada, Masayuki; Leys, Frederik; Loo, Roger; Mertens, Paul W.; Snow, James; Izumi, Akira; Miya, Katsuhiko; Eitoku, Atsuro (2008) -
Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, Ken-Ichi; Wada, Masayuki; Leys, Frederik; Loo, Roger; Hikavyy, Andriy; Mertens, Paul; Snow, Jim; Izumi, A.; Miya, Katsuhiko; Eitoku, Atsuro (2009) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Damage clustering and damage-size distributions after megasonic cleaning
De Marco, Cinzia; Wostyn, Kurt; Bearda, Twan; Sano, Ken-Ichi; Kenis, Karine; Janssens, Tom; Leunissen, Peter; Eitoku, Atsuro; Mertens, Paul (2007) -
Damage review on gate stack test structures after high-velocity aerosol cleaning
Wostyn, Kurt; Sano, Ken-Ichi; De Marco, Cinzia; Kenis, Karine; Van Den Heuvel, Dieter; Janssens, Tom; Bearda, Twan; Leunissen, Peter; Mertens, Paul; Eitoku, Atsuro (2007) -
Influences of oxide loss on contamination removal
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Kenis, Karine; Mertens, Paul (2004) -
Influences of oxide loss on contamination removal
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Kenis, Karine; Mertens, Paul (2005) -
New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss
Wada, Masayuki; Vos, Rita; Claes, Martine; Schram, Tom; Snow, J.; Mertens, Paul; Eitoku, Atsuro (2009) -
Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Sato, M.; Hirae, S.; Nakajima, K.; Nonomura, M.; Imai, M.; Mertens, Paul; Heyns, Marc (2003) -
Selective wet etching of Hf-based layers
Snow, Jim; Claes, Martine; Paraschiv, Vasile; Kraus, Harald; Eitoku, Atsuro; Vos, Rita; Mertens, Paul; Boullart, Werner; De Gendt, Stefan; Heyns, Marc (2004) -
Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
Sano, Ken-Ichi; Izumi, A.; Eitoku, Atsuro; Snow, Jim; Kesters, Els; Mertens, Paul (2005) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003)