Browsing by author "Tois, E."
Now showing items 1-6 of 6
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ALD La-based oxides for Vt-tuning in high-k/metal gate stacks
Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Tois, E.; Delabie, Annelies; Ragnarsson, Lars-Ake; Yu, HongYu; Nyns, Laura; Adelmann, Christoph; Van Elshocht, Sven (2007) -
ALD La2O3 cap layers on high-k gates to modify the metal gate work function
Maes, Jan; Swerts, Johan; Tois, E.; Delabie, Annelies; Adelmann, Christoph; Ragnarsson, Lars-Ake; Yu, HongYu (2007) -
Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O
Fedorenko, Yanina; Swerts, Johan; Maes, Jan; Tois, E.; Haukka, S.; Wang, C.G; Wilk, G.; Delabie, Annelies; Deweerd, Wim; De Gendt, Stefan (2007) -
Extreme scaled gate dielectrics by using ALD Hf-based composite materials
Pierreux, Dieter; Machkaoutsan, Vladimir; Tois, E.; Swerts, Johan; Schram, Tom; Adelmann, Christoph; Van Elshocht, Sven; Tseng, Joshua; Ragnarsson, Lars-Ake; Maes, Jan (2009) -
Extreme scaled gate dielectrics by using ALD HfO2/SrTiO3 composite structures
Pierreux, Dieter; Machkaoutsan, Vladimir; Tois, E.; Swerts, Johan; Schram, Tom; Adelmann, Christoph; Van Elshocht, Sven; Popovici, Mihaela Ioana; Conard, Thierry; Tseng, Joshua; Ragnarsson, Lars-Ake; Maes, Jan (2009) -
Properties of HfTaxOy high-k layers deposited by ALCVD
Zhao, Chao; Rittersma, Z.M.; van Berkum, J.G.M.; Snijders, J.H.M.; Hendriks, A.; Breimer, P.; Graat, P.; Maes, Jan; Witters, H.; Afanasiev, Valeri; Tois, E.; Tuominen, N.; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2005)