Browsing by author "Hung, Joey"
Now showing items 1-7 of 7
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300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns
Clerix, Jan-Willem; Delabie, Annelies; Hung, Joey; Warad, L.; Shah, Kavita (2020) -
Co and Ru dual damascene compatible metallization studies
van der Veen, Marleen; Heylen, Nancy; Lariviere, Stephane; Vega Gonzalez, Victor; Kesters, Els; Le, Quoc Toan; Teugels, Lieve; Chew, Soon Aik; Philipsen, Harold; Hung, Joey; Adelmann, Christoph; Vanstreels, Kris; Jourdan, Nicolas; Holsteyns, Frank; Struyf, Herbert; Wilson, Chris; Tokei, Zsolt (2019) -
First Monolithic Integration of 3D Complementary FET (CFET) on 300mm Wafers
Subramanian, Sujith; Hosseini, Maryam; Chiarella, Thomas; Sarkar, Satadru; Schuddinck, Pieter; Chan, BT; Radisic, Dunja; Mannaert, Geert; Hikavyy, Andriy; Rosseel, Erik; Sebaai, Farid; Peter, Antony; Hopf, Toby; Morin, Pierre; Wang, Shouhua; Devriendt, Katia; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Veloso, Anabela; Dentoni Litta, Eugenio; Baudot, Sylvain; Siew, Yong Kong; Zhou, X.; Briggs, Basoene; Capogreco, Elena; Hung, Joey; Koret, R.; Spessot, Alessio; Ryckaert, Julien; Demuynck, Steven; Horiguchi, Naoto; Boemmels, Juergen (2020) -
Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide
Krishtab, Mikhail; Hung, Joey; Koret, Roy; Turovets, Igor; Shah, Kavita; Rangarajan, Srinivasan; Warad, Laxmi; Zhang, Vanessa; Ameloot, Rob; Armini, Silvia (2020) -
Scatterometry and AFM measurement combination for area selective deposition process characterization
Saib, Mohamed; Moussa, Alain; Charley, Anne-Laure; Leray, Philippe; Hung, Joey; Koret, Roy; Turovets, Igor; Ger, Avron; Deng, Shaoren; Illiberi, Andrea; Maes, Jan Willem; Woodworth, Gabriel; Strauss, Michael (2019) -
Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Das, Sayantan; Hung, Joey; Halder, Sandip; Koret, Roy; Turovets, Igor; Charley, Anne-Laure; Leray, Philippe (2021) -
Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Muraki, Yusuke; Nuytten, Thomas; Sergeant, Stefanie; Franquet, Alexis; Spampinato, Valentina; Conard, Thierry; Hoflijk, Ilse; Meersschaut, Johan; Claessens, Niels; Moussa, Alain; Van Den Heuvel, Dieter; Hung, Joey; Koret, Roy; Charley, Anne-Laure; Leray, Philippe (2021)