Browsing by author "De Schepper, Peter"
Now showing items 21-32 of 32
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Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014) -
Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study
De Schepper, Peter; Altamirano Sanchez, Efrain; Goodyear, Andy; El Otell, Ziad; de Marneffe, Jean-Francois; De Gendt, Stefan (2014) -
Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
Altamirano Sanchez, Efrain; De Schepper, Peter; Hansen, Terje; Boullart, Werner (2013) -
Roughness mitigation at sub-30nm semiconductor patterns: the effect of H2/Ar plasma
De Schepper, Peter (2012) -
Study of ultrasound-assisted radio frequency plasma discharges in n-Dodecane
Camerotto, Elisabeth; De Schepper, Peter; Nikiforov, Anton; Brems, Steven; Shamiryan, Denis; Boullart, Werner; Leys, Christophe; De Gendt, Stefan (2012) -
The impact and importance of line width roughness on sub-20nm nanostructures
De Schepper, Peter (2012) -
The impact and importance of line width roughness on sub-20nm nanostructures
De Schepper, Peter; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Boullart, Werner; De Gendt, Stefan (2012) -
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Gendt, Stefan (2014) -
The influence of plasma processes on EUV pattern roughness mitigation for future CMOS technologies
De Schepper, Peter (2015-04) -
The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment
De Schepper, Peter; Altamirano Sanchez, Efrain; Hansen, Terje; Boullart, Werner; De Gendt, Stefan (2014) -
XAS photoresists electron/quantum yields study with synchrotron light
De Schepper, Peter; Vaglio Pret, Alessandro; Hansen, Terje; Giglia, Angelo; Hoshiko, Kenji; Mani, Antonio; Biafore, John J. (2015)