Browsing by author "Goubert, L."
Now showing items 1-5 of 5
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A ballistic electron emission microscopy (BEEM)-investigation of the effects of reactive ion etching (RIE) and of chemical pretreatment on III-V semiconductors
Van Meirhaeghe, R. L.; Vanalme, G. M.; Goubert, L.; Cardon, F.; Van Daele, P. (1997) -
A ballistic electron emission microscopy study of barrier height inhomogeneities introduced in Au/III-V semiconductor Schottky barrier contacts by chemical pretreatments
Vanalme, G. M.; Goubert, L.; Van Meirhaeghe, R. L.; Cardon, F.; Van Daele, Peter (1999) -
A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers
Van Meirhaeghe, R.; Vanalme, G.; Goubert, L.; Cardon, F.; Van Daele, P. (1998) -
A study of electrically active defects created in p-InP by CH4:H2 reactive ion etching
Goubert, L.; Van Meirhaeghe, R. L.; Clauws, P.; Cardon, F.; Van Daele, Peter (1997) -
An XPS study of the effects of semiconductor processing treatments used to make InP optoelectronic devices
Van Meirhaeghe, R. L.; Goubert, L.; Fiermans, L.; Laflère, W. H.; Cardon, F.; De Dobbelaere, Peter; Van Daele, P. (1995)