Browsing by author "Rispens, Gijsbert"
Now showing items 1-9 of 9
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Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019) -
Extending EUV lithography for DRAM applications
Rispens, Gijsbert; Van Lare, C.; Oorschot, D.; Hoefnagels, R.; Liu, S.; Van Mierlo, W.; Zuurbier, N.; Dardani, Z.; Wang, Z.; Maslow, M.; Finders, J.; Fallica, Roberto; Frommhold, Andreas; Hendrickx, Eric; Niroomand, A.; Light, S. (2020) -
Impact of local variability on defect-aware process windows
Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Schiffelers, Guido; Wahlisch, Felix; Rispens, Gijsbert; Slachter, Bram; Yoshida, Keisuke; Hara, Arisa; Oikawa, Noriaki; Pathak, Abhinav; Cerbu, Dorin; Hendrickx, Eric; Bekaert, Joost (2019) -
Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Vanelderen, Pieter; Blanco, Victor; Mao, Ming; Tomczak, Yoann; De Roest, David; Kissoon, Nicola; Rincon Delgadillo, Paulina; Rispens, Gijsbert; Schiffelers, Guido; Pathak, Abhinav; Lazzarino, Frederic; De Simone, Danilo; De Poortere, Etienne; Mc Manus, Moyra; Piumi, Daniele; Hendrickx, Eric; Vandenberghe, Geert (2019) -
Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
Van Look, Lieve; Bekaert, Joost; Frommhold, Andreas; Hendrickx, Eric; Rispens, Gijsbert; Schiffelers, Guido (2018) -
Pupil optimization for after etch defectivity: what imaging metrics matter?
Frommhold, Andreas; Franke, Joern-Holger; Maslow, Mark J.; Nafus, Kathleen; Rispens, Gijsbert (2021) -
Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
Lorusso, Gian; Rispens, Gijsbert; Rutigliani, Vito; Van Roey, Frieda; Frommhold, Andreas; Schiffelers, Guido (2019) -
Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Rutigliani, Vito; Lorusso, Gian; De Simone, Danilo; Lazzarino, Frederic; Rispens, Gijsbert; Papavieros, George; Gogolides, Evangelos; Costantoudis, Vassilios; Mack, Chris (2018) -
Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Santaclara, Jara G; Rispens, Gijsbert; Bekaert, Joost; Thiam, Arame; Maslow, Mark; Hoefnagels, Rik; Zuurbier, Nadia; van Lent, Lidia; Fong Choi, Yin (2021)