Browsing by author "Rothschild, Aude"
Now showing items 21-40 of 79
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Evolutionary process development towards next generation crystalline silicon solar cells: A semiconductor process toolbox application
John, Joachim; Prajapati, Victor; Vermang, Bart; Lorenz, Anne; Allebe, Christophe; Rothschild, Aude; Tous, Loic; Uruena De Castro, Angel; Baert, Kris; Poortmans, Jef (2012) -
Experimental evaluation of trapping efficiency in silicon nitride based charge trapping memories
Suhane, Amit; Arreghini, Antonio; Van den Bosch, Geert; Breuil, Laurent; Cacciato, Antonio; Rothschild, Aude; Jurczak, Gosia; Van Houdt, Jan; De Meyer, Kristin (2009) -
Explanation of anomalous erase behaviour and the associated device instability in TANOS Flash using a new trap characterization technique
Degraeve, Robin; Zahid, Mohammed; Van den Bosch, Geert; Blomme, Pieter; Breuil, Laurent; Kaczer, Ben; Mercuri, Marco; Rothschild, Aude; Cacciato, Antonio; Jurczak, Gosia; Groeseneken, Guido; Van Houdt, Jan (2009-10) -
Further optimization of plasma nitridation of ultra-thin oxides for 65 nm node MOSFETS
Kraus, Philip; Chua, Tai Chen; Rothschild, Aude; Cubaynes, Florence; Veloso, Anabela; Mertens, Sofie; Date, Lucien; Bauer, Thomas; Ahmed, Khaled; Nouri, Faran; Schreutelkamp, Rob; Schaekers, Marc (2004) -
Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS
Kraus, P.A.; Chua, T.C.; Ahmed, K.Z.; Campbell, J.; Nouri, F.; Cruise, J.; Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, F.N.; Date, Lucien; Schreutelkamp, Rob; Bauer, T.M. (2004) -
FUSI specific yield monitoring enabling improved circuit performance and fast feedback to production
Chiarella, Thomas; Rosmeulen, Maarten; Tigelaar, Howard; Kerner, Christoph; Nackaerts, Axel; Ramos, Javier; Lauwers, Anne; Veloso, Anabela; Jurczak, Gosia; Rothschild, Aude; Witters, Liesbeth; Yu, HongYu; Kittl, Jorge; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2007-03) -
Gate dielectrics for high performance and low power CMOS SoC applications
Cubaynes, Florence; Dachs, Charles; Detcheverry, Celine; Zegers, A.; Venezia, Vincent; Schmitz, Jurriaan; Stolk, Peter; Jurczak, Gosia; Henson, Kirklen; Degraeve, Robin; Rothschild, Aude; Conard, Thierry; Pétry, Jasmine; Da Rold, Martina; Schaekers, Marc; Badenes, Gonçal; Date, L.; Pique, D.; Al-Shareef, H.; Murto, R. (2002) -
High speed atmospheric pressure ALD for industrial scale solar cell passivation
Vermang, Bart; Rothschild, Aude; Racz, A.; John, Joachim; Poortmans, Jef; Mertens, Robert; Poodt, P.; Tiba, V.; Roozeboom, F. (2010) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Detavernier, C.; Knaepen, W.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Knaepen, W.; Detavernier, C.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Fischer, P.; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, Wouter; Clima, Sergiu; Pourtois, Geoffrey; Knaepen, W.; Detavernier, C.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Fischer, Pamela; Maes, Jan; Manger, Dirk; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics integration prospects
Kubicek, Stefan; Van Elshocht, Sven; Delabie, Annelies; Yamamoto, Kazuhiko; Beckx, Stephan; Claes, Martine; Van Hoornick, Nausikaa; Kwak, Dong Hwa; Hyun, Sangjin; Rothschild, Aude; Veloso, Anabela; Kottantharayil, Anil; Lujan, Guilherme; Kittl, Jorge; Lauwers, Anne; Kaushik, Vidya; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005) -
High-throughput temporal ALD Al2O3 passivation as rear surface passivation for industrial local Al BSF Si solar cells
Vermang, Bart; Goverde, Hans; Rothschild, Aude; John, Joachim; Poortmans, Jef; Mertens, Robert (2011) -
Impact of forming gas annealing and firing on the Al2O3/p-Si interface state spectrum
Simoen, Eddy; Rothschild, Aude; Vermang, Bart; Poortmans, Jef; Mertens, Robert (2011) -
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Travaly, Youssef; Eyckens, Brenda; Carbonell, Laure; Rothschild, Aude; Le, Quoc Toan; Brongersma, Sywert; Ciofi, Ivan; Struyf, Herbert; Furukawa, Yukiko; Stucchi, Michele; Schaekers, Marc; Bender, Hugo; Rosseel, Erik; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Van Autryve, Luc; Rabinzohn, P. (2002) -
Impact of surface preparation prior to ALD-Al2O3 deposition for PERC type solar cell
Rothschild, Aude; Toman, Janos; Penaud, Julien; Jaffrennou, Périne; Choulat, Patrick; Cornagliotti, Emanuele; Recaman Payo, Maria; Pawlak, Bartek; Das, Jo; Uruena De Castro, Angel; Singh, Sukhvinder; Horzel, Jörg (2012) -
Impact of surface preparation prior to AlOx deposition for i-PERC cells
Penaud, Julien; Jaffrennou, Périne; Rothschild, Aude; Lombardet, Benoît (2012) -
Impact of top-surface tunnel-oxide nitridation on flash memory performance and reliability
Ganguly, Udayan; Guarini, Theresa; Wellekens, Dirk; Date, Lucien; Cho, Yonah; Rothschild, Aude; Swenberg, Johanes (2010) -
Improvement of TANOS NAND Flash performance by the optimazation of a sealing layer
Breuil, Laurent; Furnemont, Arnaud; Rothschild, Aude; Van den Bosch, Geert; Cacciato, Antonio; Van Houdt, Jan (2008) -
Integration of spatial ALD aluminum oxide for rear side passivation of p-type PERC/PERL solar cells
Cornagliotti, Emanuele; Tous, Loic; Uruena De Castro, Angel; Rothschild, Aude; Russell, Richard; Lu, Vincent; Radosavljevic, Sanja; John, Joachim; Toman, Janos; Aleman, Monica; Duerinckx, Filip; Poortmans, Jef; Szlufcik, Jozef; Dielissen, Bas; Souren, Floor; Gay, Xavier; Gortzen, Roger; Hallam, Brett (2013)