Browsing by author "Grillaert, Joost"
Now showing items 21-33 of 33
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Modelling step height reduction and local removal rates based on pad-substrate interactions
Grillaert, Joost; Meuris, Marc; Heylen, Nancy; Devriendt, Katia; Vrancken, Evi; Heyns, Marc (1998) -
Modelling step height reduction based on pad-substrate interactions for different pads
Grillaert, Joost; Meuris, Marc; Heylen, Nancy; Devriendt, Katia; Vrancken, Evi; Heyns, Marc (1998) -
Modelling the influence of pad bending on the planarization performance during CMP
Grillaert, Joost; Meuris, Marc; Vrancken, Evi; Devriendt, Katia; Fyen, Wim; Heyns, Marc (1999) -
Modelling the influence of pad bending on the planarization performance during CMP
Grillaert, Joost; Meuris, Marc; Vrancken, Evi; Heylen, Nancy; Devriendt, Katia; Fyen, Wim; Heyns, Marc (2000) -
Propagation of within-die nonuniformity in CMP
Grillaert, Joost; Meuris, Marc; Heylen, Nancy; Devriendt, Katia; Heyns, Marc (1998) -
Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications
Mills, C. R.; Grover, G. S.; Mueller, B. L.; Steckenrider, J. S.; Ganeshkumar, S.; Leach, G. W.; Huang, C. K.; Grillaert, Joost (1997) -
Reduction of the premetal dielectric thermal budget for a 0.35 μm technology
Waeterloos, Joost; Meynen, Herman; de Potter de ten Broeck, Muriel; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc; Maex, Karen (1996) -
Relation between oxide-CMP induced defects and post-CMP cleaning strategies
Devriendt, Katia; Vrancken, Evi; Heylen, Nancy; Grillaert, Joost; Meuris, Marc; Heyns, Marc; Ling, Zhi Ming (1998) -
Relation between oxide-CMP induced defects and post-CMP cleaning strategies
Devriendt, Katia; Vrancken, Evi; Heylen, Nancy; Grillaert, Joost; Meuris, Marc; Heyns, Marc; Ling, Zhi Ming (1999) -
The effect of pad structuring on CMP performance
Devriendt, Katia; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heylen, Nancy; Fyen, Wim; Heyns, Marc; Chung, A.; Hsu, O. (1999) -
The evaluation and the inegration of low-k organic spin-on materials in a non-etchback interconnect process
Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1996) -
The integration of a low-k material with high organic content in a non-etchback process
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Vanhaelemeersch, Serge; Grillaert, Joost; Van den hove, Luc (1996) -
The use of semi-empirical CMP model for the optimisation of the STI-module
Grillaert, Joost; Meuris, Marc; Vrancken, Evi; Heylen, Nancy; Devriendt, Katia; Fyen, Wim; Heyns, Marc (1999)