Browsing by author "Vos, Rita"
Now showing items 21-40 of 194
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Advances in understanding wet cleaning technology and the effect of metal contamination
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
All wet photoresist strip by solvent aerosol spray
Wada, Masayuki; Sano, Ken-Ichi; Snow, Jim; Vos, Rita; Leunissen, Peter; Mertens, Paul; Eitoku, A (2008) -
An IR Spectroscopy Study of the Degradation of Surface Bound Azido-Groups in High Vacuum
Vandenbroucke, Sofie; Nisula, Mikko; Petit, Robin; Vos, Rita; Jans, Karolien; Vereecken, Philippe; Dendooven, Jolien; Detavernier, Christophe (2021) -
Applicable solvent photoresist strip process for high-k/metal gate
Wada, M; Takahashi, H; Snow, J; Vos, Rita; Mertens, PW; Shirakawa, H (2010) -
Biocompatibility assessment of advanced wafer-level based chip encapsulation
Dy, Eric; Vos, Rita; Rip, Jens; La Manna, Antonio; Op de Beeck, Maaike (2010) -
BioFET technology: aggressively scaled pMOS FinFET as biosensor
Martens, Koen; Santermans, Sybren; Gupta, Mihir; Hellings, Geert; Wuytens, Robin; Du Bois, Bert; Dupuy, Emmanuel; Altamirano Sanchez, Efrain; Jans, Karolien; Vos, Rita; Stakenborg, Tim; Lagae, Liesbet; Heyns, Marc; Severi, Simone; Van Roy, Wim (2019) -
Biosensing with SiO2-covered SPR substrates in a commercial SPR-tool
Ryken, Jef; Li, Jiaqi; Steylaerts, Tim; Vos, Rita; Loo, Josine; Jans, Karolien; Van Roy, Wim; Stakenborg, Tim; Van Dorpe, Pol; Lammertyn, Jeroen; Lagae, Liesbet (2014) -
Capping-metal gate integration technology for multiple-VT CMOS in MuGFETs
Veloso, Anabela; Witters, Liesbeth; Demand, Marc; Ferain, Isabelle; Son, Nak Jin; Kaczer, Ben; Roussel, Philippe; Adelmann, Christoph; Brus, Stephan; Richard, Olivier; Bender, Hugo; Conard, Thierry; Vos, Rita; Rooyackers, Rita; Van Elshocht, Sven; Collaert, Nadine; De Meyer, Kristin; Biesemans, Serge; Jurczak, Malgorzata (2008) -
Challenges with respect to high-k/metal gate stack etching and cleaning
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantation
Tsvetanova, Diana; Vos, Rita; Vereecke, Guy; Clemente, Francesca; Vanstreels, Kris; Conard, Thierry; Parac-Vogt, Tatjana; Mertens, Paul; Heyns, Marc (2009) -
Chemical vapor deposition of azidoalkylsilane monolayer films
Vos, Rita; Rolin, Cedric; Rip, Jens; Conard, Thierry; Steylaerts, Tim; Vidal Cabanilles, Maria; Levrie, Karen; Jans, Karolien; Stakenborg, Tim (2018) -
Chip-based super-resolution structured illumination microscopy
Deng, Qingzhong; Arisev, Ongun; Kouznetsov, Dmitry; Hasan, Mahmudul; Neutens, Pieter; Luo, Zhenxiang; Ha, Seungkyu; Covens, Kris; Vos, Rita; Van Dorpe, Pol; Verellen, Niels (2020) -
Cleaning and strip requirement for metal gate based CMOS integration
Schram, Tom; Sebaai, Farid; Claes, Martine; Vos, Rita; Wada, Masayuli; Rohr, Erika; Kubicek, Stefan (2009) -
Cleaning and strip requirements for metal gate based CMOS integration
Schram, Tom; Sebaai, Farid; Claes, Martine; Vos, Rita; Wada, Masayuki; Albert, Johan; Rohr, Erika; Kubicek, Stefan (2009) -
Cleaning and surface preparation for SiGe and Ge channel device
Wada, M; Takahashi, H; Snow, J; Vos, Rita; Mertens, Paul; Shirakawa, H (2010) -
Cleaning aspects of novel materials after CMP
Vos, Rita; Wada, M.; Arnauts, Sophia; Takahashi, H.; Cuypers, Daniel; Struyf, Herbert; Mertens, Paul (2011) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Cleaning uniformity of silicon wafers in megasonic tanks
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Vos, Rita; Mertens, Paul (2003) -
Cleaning, rinsing and drying aspects in post-Cu-CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heyns, Marc (1999)