Browsing by author "Goethals, Mieke"
Now showing items 21-40 of 120
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Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
Goethals, Mieke; Van Roey, Frieda; Sugihara, Takashi; Van den hove, Luc; Vertommen, Johan; Klippert, W. (1998) -
DUV Lithography for 0.35 µm CMOS Processing
Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1994) -
DUV lithography for 0.35 μm CMOS processing
Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1995) -
DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices
Op de Beeck, Maaike; Vandenberghe, Geert; Goethals, Mieke; Van den hove, Luc (1996) -
EUV lithography development progress in IMEC
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2009) -
EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
Goethals, Mieke; Demuynck, Steven; Van Roey, Frieda; Baudemprez, Bart; Hermans, Jan; Huffman, Craig; Lazzarino, Frederic; Pollentier, Ivan; Hendrickx, Eric; Jonckheere, Rik; Verhaegen, Staf; Veloso, Anabela; Vandenberghe, Geert; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUV lithography with the alpha demo tools: status and challenges
Harned, Noreen; Goethals, Mieke; Groeneveld, Rogier; Kuerz, Peter; Lowisch, Martin; Meijer, Henk; Meiling, Hans; Ronse, Kurt; Ryan, Jim; Tittnich, Mike; Voorma, Harm-Jan; Zimmmerman, John; Mickan, Uwe; Lok, Sjoerd (2007) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
EUV lithography: status and further challenges towards a maturing technology
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2010) -
EUV pattern shift compensation strategies
Schmoeller, Thomas; Klimpel, Thomas; Kim, In Sung; Lorusso, Gian; Myers, Alan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
EUV patterning improvement toward high-volume manufacturing
Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke (2015) -
EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV processing investigation on state-of-the-art coater/developer system
Shite, Hideo; Bradon, Neil; Shimoaoki, T.; Kobayashi, S.; Nafus, Kathleen; Kosugi, Hitoshi; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Gronheid, Roel; Jehoul, Christiane (2011) -
EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist performance update on ADT and NXE:3100 scanner
Goethals, Mieke; Niroomand, Ardavan; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Van Den Heuvel, Dieter (2011) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
EUV resist screening: current performance and issues
Goethals, Mieke; Gronheid, Roel; Leunissen, Peter; Van Roey, Frieda; Solak, Harun (2005-06)