Browsing Conference contributions by imec author "80dd9ecda1d431bdcee1f3de547708cb6771c818"
Now showing items 41-49 of 49
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Threshold voltage control in PMOSFETs with polysilicon or fully-Silicided gates on Hf-based gate dielectric using controlled lateral oxidation
Kaushik, Vidya; Rohr, Erika; Hyun, S.; De Gendt, Stefan; Van Elshocht, Sven; Delabie, Annelies; Everaert, Jean-Luc; Veloso, Anabela; Brus, Stephan; Ragnarsson, Lars-Ake; Richard, Olivier; Caymax, Matty; Heyns, Marc (2005) -
Threshold voltage control in polysilicon or fully-silicided-Hf-based gate dielectric pMOSFETs using controlled lateral oxidation
Kaushik, Vidya; Rohr, Erika; Hyun, Sangjin; De Gendt, Stefan; Van Elshocht, Sven; Delabie, Annelies; Everaert, Jean-Luc; Veloso, Anabela; Brus, Stephan; Ragnarsson, Lars-Ake; Richard, Olivier; Caymax, Matty; Heyns, Marc (2005) -
Titanium (germano-)silicides featuring 10-9 $Xcm2 contact resistivity and improved compatibility to advanced CMOS technology
Yu, Hao; Schaekers, Marc; Chew, Soon Aik; Everaert, Jean-Luc; Dabral, Ashish; Pourtois, Geoffrey; Horiguchi, Naoto; Mocuta, Dan; Collaert, Nadine; De Meyer, Kristin (2018) -
Tungsten planarization by gas cluster ion beam with CHF3
Everaert, Jean-Luc; Fernandez, Luis; Vos, Ingrid; Van Ammel, Annemie; Vrancken, Christa; Dekoster, Johan; Burke, Edd; Vancoille, Eric (2013) -
Use of corona charge photo-conductance decay (charge-PCD) for fast metal contamination monitoring of high temperature processes
Huyghebaert, Cedric; Bearda, Twan; Rosseel, Erik; Everaert, Jean-Luc; Don, Eric; Pavelka, Tibor (2008) -
Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Yang, Lijun; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Loo, Roger; Lin, Vic; Vandervorst, Wilfried; Caymax, Matty (2009) -
Vapor phase doping and sub-melt laser anneal for the fabrication of Si-based ultra-shallow junctions in sub-32 nm CMOS technology
Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Loo, Roger; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Caymax, Matty; Vandervorst, Wilfried (2009) -
Vapor phase doping and sub-melt laser anneal for ultra-shallow extension junctions in sub-32 nm CMOS technology
Nguyen, Duy; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Loo, Roger; Goossens, Jozefien; Moussa, Alain; Clarysse, Trudo; Vandervorst, Wilfried (2009-09) -
Vapor phase doping for ultra shallow juntion formation in advanced Si CMOS devices
Shimizu, Yasua; Nguyen, Duy; Jiang, Sijia; Rosseel, Erik; Takeuchi, Shotaro; Everaert, Jean-Luc; Loo, Roger; Vandervorst, Wilfried; Caymax, Matty (2010-01)