Browsing Articles by imec author "a2d2100858e62bf4d4eccb36be1e670060372871"
Now showing items 1-15 of 15
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3D sequential stacked planar devices featuring low-temperature replacement metal gate junctionless top devices with improved reliability
Vandooren, Anne; Franco, Jacopo; Parvais, Bertrand; Wu, Zhicheng; Witters, Liesbeth; Walke, Amey; Li, Waikin; Peng, Lan; Deshpande, Veeresh Vidyadhar; Bufler, Fabian; Rassoul, Nouredine; Hellings, Geert; Jamieson, Geraldine; Inoue, Fumihiro; Verbinnen, Greet; Devriendt, Katia; Teugels, Lieve; Heylen, Nancy; Vecchio, Emma; Tao, Zheng; Rosseel, Erik; Vanherle, Wendy; Hikavyy, Andriy; Chan, BT; Ritzenthaler, Romain; Besnard, Guillaume; Schwarzenbach, Walter; Gaudin, Gweltaz; Radu, Ionut; Nguyen, Bich-Yen; Waldron, Niamh; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine (2018-11) -
Buried power rail integration with FinFETs for ultimate CMOS scaling
Gupta, Anshul; Varela Pedreira, Olalla; Arutchelvan, Goutham; Zahedmanesh, Houman; Devriendt, Katia; Hanssen, Frederik; Tao, Zheng; Ritzenthaler, Romain; Wang, Shouhua; Radisic, Dunja; Kenis, Karine; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; Jourdan, Nicolas; Chan, BT; Subramanian, Sujith; Schleicher, Filip; Hopf, Toby; Peter, Antony; Rassoul, Nouredine; Debruyn, Haroen; Demonie, Ingrid; Siew, Yong Kong; Chiarella, Thomas; Briggs, Basoene; Zhou, Daisy; Rosseel, Erik; De Keersgieter, An; Capogreco, Elena; Dentoni Litta, Eugenio; Boccardi, Guillaume; Baudot, Sylvain; Mannaert, Geert; Bontemps, Noemie; Sepulveda Marquez, Alfonso; Mertens, Sofie; Kim, Min-Soo; Dupuy, Emmanuel; Vandersmissen, Kevin; Paolillo, Sara; Cousserier, Joris; Yakimets, Dmitry; Lazzarino, Frederic; Chehab, Bilal; Favia, Paola; Drijbooms, Chris; Jaysankar, Manoj; Morin, Pierre; Altamirano Sanchez, Efrain; Mitard, Jerome; Wilson, Chris; Holsteyns, Frank; Boemmels, Juergen; Demuynck, Steven; Tokei, Zsolt; Horiguchi, Naoto (2020) -
Chemical mechanical planarization of patterned InP in shallow trench isolation (STI) template structures using hydrogen peroxide-based silica slurries containing oxalic acid or citric acid
Matovu, John B.; Ong, Patrick; Teugels, Lieve; Leunissen, Peter; Babu, S. V. (2014) -
Chemical mechanical polishing and planarization of Mn-based barrier/Ru liner films in Cu interconnects for advanced metallization nodes
Sagi, K.V.; Teugels, Lieve; van der Veen, Marleen; Struyf, Herbert; Babu, S.V. (2017) -
Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structures
Sagi, K.V.; Teugels, Lieve; van der Veen, Marleen; Struyf, Herbert; Alety, S.R.; Babu, S.V. (2017) -
Critical dimension metrology using Raman spectroscopy
Gawlik, Andrzej; Bogdanowicz, Janusz; Nuytten, Thomas; Charley, Anne-Laure; Teugels, Lieve; Misiewicz, Jan; Vandervorst, Wilfried (2020) -
Effects of H2O2 and pH on the Chemical Mechanical Planarization of Molybdenum
Ryu, Heon-Yul; Teugels, Lieve; Devriendt, Katia; Struyf, Herbert; Kim, Tae-Gon; Park, Jin-Goo (2021) -
Electrical characterization of CNT contacts with Cu damascene top contact
van der Veen, Marleen; Vereecke, Bart; Huyghebaert, Cedric; Cott, Daire; Masahito, Sugiura; Kashiwagi, Yusaku; Teugels, Lieve; Caluwaerts, Rudy; Chiodarelli, Nicolo; Vereecken, Philippe; Beyer, Gerald; Heyns, Marc; De Gendt, Stefan; Tokei, Zsolt (2013) -
InGaAs gate-all-around nanowire devices on 300mm substrates
Waldron, Niamh; Merckling, Clement; Teugels, Lieve; Ong, Patrick; Ibrahim, Ansar; Sebaai, Farid; Pourghaderi, Mohammad Ali; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2014) -
Inspection, characterization and classification of defects for improved CMP of III-V materials
Bhonsle, Rithu; Teugels, Lieve; Usman Ibrahim, Ansar; Ong, Patrick; Delande, Tinne; Krishnan, S; Siebert, Max; Struyf, Herbert; Leunissen, Leonardus (2015) -
Investigation of guanidine carbonate-based slurries for chemical Mechanical polishing of Ru/TiN barrier films with minimal corrosion
Sagi, K.V.; Amanapu, H.P.; Teugels, Lieve; Babu, S.V. (2014) -
Investigation of percarbonate based slurry chemistry for controlling galvanic corrosion during CMP of ruthenium
Turk, Michael; Rock, Simon; Amanapu, Hari; Teugels, Lieve; Roy, Dipankar (2013-03) -
Microwave Properties of Ba-Substituted Pb(Zr0.52Ti0.48)O3 after Chemical Mechanical Polishing
Luciano, Federica; Teugels, Lieve; McMitchell, Sean; Talmelli, Giacomo; Guerenneur, Anais; Stheins, Renzo; Caluwaerts, Rudy; Conard, Thierry; Vaesen, Inge; Sergeant, Stefanie; Van Dorpe, Pol; De Gendt, Stefan; Dekkers, Matthijn; Swerts, Johan; Ciubotaru, Florin; Adelmann, Christoph (2023) -
Replacement fin processing for III-V on Si: From FinFets to nanowires
Waldron, Niamh; Merckling, Clement; Teugels, Lieve; Ong, Patrick; Sebaai, Farid; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2016) -
Role of ruthenium texture and guanidine carbonate on chemical mechanical polishing of ruthenium films
Amanapu, Hariprasad; Sagi, Kaushik; Teugels, Lieve; Babu, S.V. (2013)