Browsing Articles by imec author "ece2d2ab8306568fca59f9187ed62b93f0cb44a8"
Now showing items 1-7 of 7
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Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation
Tinck, Stefan; Altamirano Sanchez, Efrain; De Schepper, Peter; Bogaerts, Annemie (2014) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; El Otell, Ziad; Boullart, Werner; De Gendt, Stefan (2014) -
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
Zhang, Yu-Ru; Tinck, Stefan; De Schepper, Peter; Wang, You-Nian; Bogaerts, Annemie (2015) -
Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching
Gul, Banat; Tinck, Stefan; De Schepper, Peter; Rehman, Aman-ur (2015) -
Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
De Schepper, Peter; Vaglio Pret, Alessandro; El Otell, Ziad; Hansen, Terje; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Study of ultrasound-assisted radio frequency plasma discharges in n-Dodecane
Camerotto, Elisabeth; De Schepper, Peter; Nikiforov, Anton; Brems, Steven; Shamiryan, Denis; Boullart, Werner; Leys, Christophe; De Gendt, Stefan (2012) -
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015)