Browsing Articles by title

Novel volatile film for the protection of organo-silicate glass dielectric materials

Fujikawa, Makoto; Yamaguchi, Tatsuya; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru; Kawasaki, H.; Chanson, Romain; de Marneffe, Jean-Francois (2019)

Novel Y-function based strategy for parameter extraction in S/D asymmetric architecture devices and low frequency noise characterization in GAA Si VNW pMOSFETs

Tahiat, A.; Cretu, B.; Veloso, Anabela; Simoen, Eddy (2023)

NOVIFAST: A fast algorithm for accurate and precise VFA MRI T1 mapping

Ramos-Llordén, Gabriel; Vegas-Sánchez-Ferrero, Gonzalo; Björk, Marcus; Vanhevel, Floris; Parizel, Paul; San José Estépar, Raúl; den Dekker, Arnold Jan; Sijbers, Jan (2018)

Now you know what you're doing right and wrong ! Peer feedback quality in synchronous peer assessment in secondary education

Rotsaert, Tijs; Panadero, Ernesto; Schellens, Tammy; Raes, Annelies (2018)

Nozzle Scaling Effects for The Thermohydraulic Performance of Microjet Impingement Cooling with Distributed Returns

Wei, Tiwei; Oprins, Herman; Fang, Liang; Cherman, Vladimir; De Wolf, Ingrid; Beyne, Eric; Baelmans, Tine (2020)

NPN SiGe Hetero Junction Transistor Latch-Up Memory Selector

Hiblot, Gaspard; Ravsher, Taras; Loo, Roger; Yengula Venkata Ramana, Bhuvaneshwari; Canvel, Yann; Franchina Vergel, Nathali; Fantini, Andrea; Houshmand Sharifi, Shamin; Bazzazian, Nina; Ayyad, Mustafa; Merkulov, Alex; Kar, Gouri Sankar; Couet, Sebastien (2023-02-03)

NRZ, Duobinary, or PAM4?: Choosing among high-speed electrical interconnects

Van Kerrebrouck, Joris; De Keulenaer, Timothy; Pierco, R.; De Geest, J; Sinsky, J.H.; Kozicki, B.; Yin, Xin; Torfs, Guy; Bauwelinck, Johan (2019-07)

Nuclear hyperfine interaction of the DX center and its persistent photoionization in Te-doped Alx/Ga1-xAs

Bemelmans, Hilde; Borghs, Gustaaf; Langouche, G. (1994)

Nuclear spin orientation by electrical spin injection in an AlxGa1xAs/GaAs spin-polarized light-emitting diode

Van Dorpe, Pol; Van Roy, Wim; De Boeck, Jo; Borghs, Gustaaf (2005-07)

Nuclear-induced dephasing and signatures of hyperfine effects in isotopically purified C-13 graphene

Strenzke, Vincent; Meyer, Jana M.; Grandt-Ionita, Isabell; Prada, Marta; Kim, Hyun-Seok; Heilmann, Martin; Lopes, Joao Marcelo J.; Tiemann, Lars; Blick, Robert H. (2022)

Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayers

Bogan, Justin; Brady-Boyd, Anita; Armini, Silvia; Lundy, R.; Selvaraju, V.; O'Connor, Robert (2018)

Nucleation and coalescence of tungsten disulfide layers grown by metalorganic chemical vapor deposition

Tang, Haonan; Pasko, Sergej; Krotkus, Simonas; Anders, Thorsten; Wockel, Cornelia; Mischke, Jan; Wang, Xiaochen; Conran, Ben; McAleese, Clifford; Teo, Ken; Banerjee, Sreetama; Medina Silva, Henry; Morin, Pierre; Asselberghs, Inge; Ghiami, Amir; Grundmann, Annika; Tang, Songyao; Fiadziushkin, Hleb; Kalisch, Holger; Vescan, Andrei; El Kazzi, Salim; Marty, Alain; Dosenovic, Djordje; Okuno, Hanako; Le Van-Jodin, Lucie; Heuken, Michael (2023)

Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces

Philipsen, Harold; Jehoul, Hannes; Inoue, Fumihiro; Vandersmissen, Kevin; Yang, Liu; Struyf, Herbert; van Dorp, Dennis (2017)

Nucleation and growth mechanism for atomic layer deposition of Al2O3 on two-dimensional WS2 monolayer

Lee, Tsu-Ting; Chiranjeevulu, Kashi; Pedaballi, Sireesha; Cott, Daire; Delabie, Annelies; Dee, Chang-Fu; Chang, Edward Yi (2023)

Nucleation and growth mechanism of 2d SnS2 by chemical vapor deposition: initial 3D growth followed by 2D lateral growth

Zhang, Haodong; van Pelt, Thomas; Nalin Mehta, Ankit; Bender, Hugo; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Vandervorst, Wilfried; Delabie, Annelies (2018)

Nucleation and growth mechanisms of Al2O3 ALD on synthetic polycrystalline MoS2

Zhang, Haodong; Chiappe, Daniele; Meersschaut, Johan; Conard, Thierry; Franquet, Alexis; Nuytten, Thomas; Mannarino, Manuel; Radu, Iuliana; Vandervorst, Wilfried; Delabie, Annelies (2017)

Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si-O-H) and thermal oxide (SiO2 or Si-O-N)

Green, Martin; Ho, M.Y.; Busch, B.; Wilk, G.D.; Sorsch, T.; Conard, Thierry; Brijs, Bert; Vandervorst, Wilfried; Räisänen, P.I.; Muller, D.; Bude, M.; Grazul, J. (2002)