Browsing Presentations by author "Vaglio Pret, Alessandro"
Now showing items 1-11 of 11
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2D and 3D photoresist line roughness characterization
Vaglio Pret, Alessandro; Gronheid, Roel; Kunnen, Eddy; Pargon, Erwine; Luere, Olivier; Bianchi, Davide (2012) -
Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Kuppuswamy, Vijaya Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2011) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
Impact of EUV lithography line edge roughness on 16 nm memory generation
Vaglio Pret, Alessandro; Poliakov, Pavel; Bianchi, Davide; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2011) -
Impact of EUV mask surface roughness on LER
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Leeson, Michael; Yan, Pei-Yang (2012) -
Impact of extreme UV mask flatness on resist roughness
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Leeson, Michael; Pei-Yang, Yan (2012) -
Mask line roughness contribution in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel (2010) -
Mask roughness effects on pattern variability
Vaglio Pret, Alessandro; Gronheid, Roel; Lorusso, Gian; Younkin, Todd; Pei-Yang, Yan; Leeson, Michael (2012) -
Plasma smoothing of extreme ultraviolet photoresist: LWR reduction at 30nm half pitch
Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; Gronheid, Roel; Demand, Marc; Boullart, Werner (2011) -
Roughness analysis for (EUV) optical lithography
Vaglio Pret, Alessandro; Poliakov, Pavel; Bianche, Davide; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Van Houdt, Jan; Dehaene, Wim (2010) -
Stochastic effects and resist variability in high resolution lithography
Vaglio Pret, Alessandro; Garidis, K.; Gronheid, Roel; Biafore, John (2012)