Browsing Presentations by imec author "2c60d19f643e70d5f26a2b97629c1c07241e9290"
Now showing items 1-20 of 128
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A critical perspective on TunnelFETs
Heyns, Marc; Verhulst, Anne (2014) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Mertens, Paul; Heyns, Marc (2004) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A perspective on dry laser cleaning for semiconductor manufacturing
Vereecke, Guy; Röhr, Erika; Van Hoeymissen, Jan; Mertens, Paul; Heyns, Marc (2001) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, I; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2004) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced surface preparation leading into the nano-era
Onsia, Bart; De Gendt, Stefan; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Conard, Thierry; Heyns, Marc; Lin, S.; Green, Martin; Tsai, Wilman (2003) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Advancing CMOS beyond the Si roadmap: chronicle of a (r)evolution foretold
Heyns, Marc (2012) -
ALD for highly scaled CMOS and beyond
Heyns, Marc (2008) -
All-electrical spin wave interference towards logic operations
Talmelli, Giacomo; Devolder, Thibaut; Heyns, Marc; Radu, Iuliana; Adelmann, Christoph; Ciubotaru, Florin (2018) -
Alternative channel materials for MOS devices
Heyns, Marc (2008) -
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
An atomistic view of a nanoelectronic world
Pourtois, Geoffrey; Clima, Sergiu; Sankaran, Kiroubanand; Mees, Maarten; De Gendt, Stefan; Heyns, Marc (2012) -
An inelastic quantum tunnelling model for current conduction after soft-breakdown
Nigam, Tanya; Degraeve, Robin; Heyns, Marc; Groeseneken, Guido; Maes, Herman; Crupi, Felice (1998) -
Assessment of quadrupole mass spectrometry as an in situ HDP-CVD process diagnostic technique
Van Hoeymissen, Jan; Hughes, Carolyn; Heyns, Marc (1999) -
Atomic layer deposition as an enabling technology for fabrication of germanium MOS transistor
Eneman, Geert; Delabie, Annelies; Van Elshocht, Sven; De Jaeger, Brice; Nicholas, Gareth; Martens, Koen; Brunco, David; Zimmerman, Paul; Houssa, Michel; Pourtois, Geoffrey; Kaczer, Ben; Leys, Frederik; Winderickx, Gillis; Huyghebaert, Cedric; Terzieva, Valentina; Loo, Roger; Caymax, Matty; Meuris, Marc; Heyns, Marc (2007) -
Band alignment at the interfaces of Al2O3 and ZrO2-based insulators with metals and Si
Afanas'ev, V. V.; Houssa, Michel; Stesmans, Andre; Heyns, Marc (2001) -
Behaviour of metallic contaminants during MOS processing
Bearda, Twan; De Gendt, Stefan; Loewenstein, Lee; Knotter, Martin; Mertens, Paul; Heyns, Marc (1998) -
Can we increase the efficiency of organic contamination removal by ozone/di-water processes by using additives
De Smedt, Frank; Vankerckhoven, Hans; De Gendt, Stefan; Heyns, Marc; Vinckier, Chris (2002)