Browsing Presentations by imec author "407456c2e7a32ba10d38e3dedc868bb277b01c5a"
Now showing items 1-11 of 11
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A high-reliable Cu/ULK integration scheme using Metal Hard Mask and Low-k capping film
Travaly, Youssef; Tsutsue, M.; Ikeda, Atsushi; Verdonck, Patrick; Tokei, Zsolt; Willegems, Myriam; Van Aelst, Joke; Struyf, Herbert; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Claes, Martine; Heylen, Nancy; Sinapi, Fabrice; Richard, Olivier; De Roest, David; Kaneko, S; Kemeling, N; Fukazawa, A; Matsuki, N; Matsushita, K; Tsuji, N; Kagami, K; Sprey, Hessel; Beyer, Gerald (2007) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Effect of chemical solution on the stability of low-k films
Kesters, Els; Le, Quoc Toan; Baklanov, Mikhaïl; Boullart, Werner; Mertens, Paul (2004) -
Integration of 50 nm half pitch single damascene copper trenches in BDII by means of double patterning 193 nm immersion lithography on metal hardmask
Van Olmen, Jan; Al-Bayati, A; Beyer, Gerald; Boelen, Pieter; Carbonell, Laure; Zhao, Chao; Ciofi, Ivan; Claes, Martine; Cockburn, Andrew; Druais, Gael; Hendrickx, Dirk; Heylen, Nancy; Kesters, Els; Lytle, S.; Noori, A.; Op de Beeck, Maaike; Struyf, Herbert; Tokei, Zsolt; Versluijs, Janko (2007) -
Modification of photoresist by UV for post-etch wet strip applications
Le, Quoc Toan; Kesters, Els; Claes, Martine; Lux, Marcel; Vereecke, Guy (2008) -
Restoration of surface and bulk properties of ash plasma-treated porous low-k dielectrics
Le, Quoc Toan; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner; Kesters, Els; Van Puymbroeck, Jan; Vanhaelemeersch, Serge (2005) -
Selection of ESH solvents for cleaning applications in semiconductor manufacturing
Kesters, Els; Claes, Martine; Le, Quoc Toan; Barthomeuf, Kevin; Lux, Marcel; Vereecke, Guy; Bearda, Twan; Durkee, John (2008) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2004)