Browsing Presentations by imec author "65e63f3c53a926f036ade4b9b3b8c90925a8616b"
Now showing items 1-20 of 22
-
A detailed study of semiconductor wafer drying
Fyen, Wim; Holsteyns, Frank; Bearda, Twan; Arnauts, Sophia; Van Steenbergen, Jan; Doumen, Geert; Kenis, Karine; Mertens, Paul (2004) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Capturing wetting states in nanopatterned silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; Struyf, Herbert; Holsteyns, Frank; De Gendt, Stefan (2013) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Cleaning uniformity of silicon wafers in megasonic tanks
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Vos, Rita; Mertens, Paul (2003) -
Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Defect inspection of Cu metallization
Holsteyns, Frank; Carbonell, Laure; Vos, Ingrid; Vrancken, Evi; Tokei, Zsolt; Mertens, Paul (2002) -
Evaluation of megasonic cleaning for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Xu, Kaidong; Lux, Marcel; Vos, Rita; Mertens, Paul; Loper, S.; Grothe, P. (2003) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
In-situ wetting characterization of silicon nanopillars
Vrancken, Nandi; Sergeant, Stefanie; Doumen, Geert; Holsteyns, Frank; Terryn, Herman; De Gendt, Stefan; Xu, XiuMei (2016) -
Megasonics: a cavitation driven process
Holsteyns, Frank; Lee, Kuntack; Graf, S.; Palmans, Roger; Vereecke, Guy; Mertens, Paul (2004) -
Optimization of cleaning processes for 100 nm and smaller design rules
Xu, Kaidong; Vos, Rita; Holsteyns, Frank; Kenis, Karine; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2001) -
Performance of a linear single wafer IPA vapour based drying system
Fyen, Wim; Arnauts, Sophia; Holsteyns, Frank; Doumen, Geert; Vereecke, Guy; Van Steenbergen, Jan; Mertens, Paul (2004) -
Process monitoring and qualification of CVD/PVD tools using comprehensivesurface haze information
Holsteyns, Frank; Roels, Jan; Kenis, Karine; Mertens, Paul (2002) -
Removal of nano-particles and structural damage in megasonic cleaning of silicon wafers
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Removal of nano-particles by using megasonic cleaning
Holsteyns, Frank; Vereecke, Guy; Coenen, V.; Vos, Rita; Mertens, Paul (2002) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003) -
The impact of backside particles on the limits of optical lithography
Bearda, Twan; Mertens, Paul; Holsteyns, Frank; De Bisschop, Peter; Compen, R.; van Meer, R.; Heyns, Marc (2004)