Browsing Presentations by imec author "8078b3c6f72b09ae119dadbab6c829be29c5ec8c"
Now showing items 1-18 of 18
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ASML NXE:3100 pre-production EUV scanner performance at imec
Hendrickx, Eric (2012) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Chromeless phase lithography for contact hole imaging
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004) -
Creative metrology development for EUVL: Flare and out-of-band qualification
Lorusso, Gian; Hendrickx, Eric; Davydova, N.; Peng, Y.; Eurlings, M.; Feenstra, K.; Jiang, J. (2011) -
EUV lithography development progress in IMEC
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2009) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
EUV lithography: status and further challenges towards a maturing technology
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2010) -
EUV mask pattern correction
Jonckheere, Rik; Hendrickx, Eric (2009) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Impact of mask stack on high NA EUV imaging
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Vandenberghe, Geert; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2012) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Qualification of EUV specific parameters: out-of-band and Flare
Lorusso, Gian; Hendrickx, Eric (2011) -
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
Two-dimensional feature stochastic printing with mask deficiencies in high-NA EUV
Melvin III, Lawrence; Jonckheere, Rik; Hendrickx, Eric (2021)