Browsing by Author "Alves Donaton, Ricardo"
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Publication A BEEM study of PtSi Schottky contacts on ion-milled Si
Publication Characterization and integration in Cu damascene structures of AURORA, an inorganic low-k dielectric
Proceedings paper2001, Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, 23/04/2000, p.D5.14.1-D5.14-6Publication Characterization and integration of a new Si-O-C film deposited by CVD
Proceedings paper2001, Advanced Metallization Conference 2000, 3/10/2000, p.595-601Publication Characterization of ultra-thin PtSi films for infrared detectors
Proceedings paper1996, Silicide Thin Films - Fabrication, Properties, and Applications, 27/11/1995, p.449-454Publication CoSi2Si1-xGx-interfaces for Schottky barrier infrared detectors with extended detection regime
Proceedings paper1995, Growth and Characterization of Materials for Infrared Detectors II, 13/07/1995, p.175-84Publication Elimination of HF-last cleaning related CoSi2 defects formation
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.177-180Publication Etching of CoSi2 in HF-based solutions
Journal article1995, Appied Surface Science, (89) 3, p.221-7Publication Focused ion beam analysis of organic low-k dielectrics
; Alves Donaton, RicardoProceedings paper2000, Proceedings of the 26th International Symposium on Testing and Failure Analysis - ISTFA, 12/11/2000, p.397-405Publication Formation of CoSi2 on strained Si0.8Ge0.2 using a sacrificial Si layer
Journal article1995, Applied Surface Science, 91, p.77-81Publication Influence of SiGe thickness on the Co/SiGe/Si solid state reaction
Proceedings paper1999, Advanced Interconnects and Contacts, 05/04/1999, p.151-156Publication Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides
Journal article1998, Journal of the Electrochemical Society, (145) 9, p.3240-3246Publication Mechanical analysis of a SiLK/Cu dual damascene interconnect system
Proceedings paper2001, Advanced Metallization Conference 2000, 3/10/2000, p.469-473Publication Micro-characterisation of Pt silicides prepared on (100) silicon
Proceedings paper1997, Microscopy of Semiconducting Materials 1997, 7/04/1997, p.497-500Publication Microstructural studies by transmission electron microscopy of the formation of ultrathin PtSi layers with novel silicidation processes
Journal article1999, Journal of Materials Research, (14) 6, p.2577-2587Publication New approaches for formation of ultra-thin PtSi layers for infrared applications
Proceedings paper1998, Rapid Thermal and Integrated Processing VII, 13/04/1998, p.307-312Publication New approaches for formation of ultra-thin PtSi layers for infrared applications
Proceedings paper1998, Advanced Interconnects and Contact Materials and Processes for Future Integrated Circuits, 13/04/1998, p.241Publication New process for controlled formation of ultra-thin PtSi films for infra-red detector applications
Proceedings paper1995, Growth and Characterization of Materials for Infrared Detectors II, 13/07/1995, p.185-190Publication New technique for forming continuous, smooth and uniform ultrathin (3nm) PtSi layers
Journal article1999, Electrochemical and Solid State Letters, (2) 4, p.195-197Publication Nondestructive characterization of thin silicides using x-ray reflectivity
Publication Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films