Browsing by Author "Baeyens, Martien"
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Publication Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination
Journal article1999, Microelectronic Engineering, (45) 2_3, p.197-208Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, Defects in Silicon III, 2/05/1999, p.401-413Publication Effect of metal contamination and improved cleaning strategies
Proceedings paper1999, 6th International SCP Symposium "Meeting the Surface Preparation Challenges of the New Millennium", 10/05/1999Publication Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.119-122Publication Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Fluorine in thermal oxides from HF preoxidation surface treatments
Journal article1999, Electrochemical and Solid State Letters, (2) 7, p.336-338Publication Gas-phase surface proessing prior to 3.2nm gate oxidation
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Gas-phase surface proessing prior to 3.2nm gate oxidation
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.85-88Publication Hydrogen peroxide decomposition in ammonia solutions
Journal article1999, J. Electrochem. Soc., (146) 9, p.3476-3481Publication Hydrogen peroxide decomposition in ammonia solutions
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.15-18Publication Hydrogen peroxide decomposition in ammonin solutions
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Influence of frequency on the removal efficiency of nano-particles in a megasonic spray cleaning tool
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.147-151Publication Influence of hardware and chemistry on the removal of nano-particles in a megasonic cleaning tank
Proceedings paper2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.143-147Publication Quantitative modeling of H2O2 decomposition in SC1
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.176-183Publication Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.233-236Publication Silicon surface metal contamination measurements using grazing-emission XRF spectrometry
Proceedings paper1997, Science and Technology of Semiconductor Surface Preparation, 1/04/1997, p.397-402Publication Single step alkaline cleaning solution for advanced semiconductor cleaning
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Single step alkaline cleaning solution for advanced semiconductor cleaning
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.23-26