Browsing by Author "Buca, Dan"
- Results per page
- Sort Options
Publication Benchmarking Ge1-xSnx CVD Epitaxy using GeH4 and Ge2H6
Meeting abstract2016-11, JSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration", 24/11/2016, p.20-21Publication Epitaxial GeSn: impact of process conditions on material quality
Meeting abstract2018-05, Joint ISTDM/ICSI Conference, 27/05/2018, p.195-196Publication Epitaxial GeSn: Impact of process conditions on material quality
; ;Shimura, Yosuke ;Ike, Shinichi; ;Stoica, Toma ;Stange, DanielaBuca, DanJournal article2018, Semiconductor Science and Technology, (33) 11, p.114010Publication Epitaxial GeSn: Impact of process conditions on material quality
; ;Shimura, Yosuke ;Ike, Shinichi; ;Stoica, Toma ;Stange, DanielaBuca, DanOral presentation2018, eMRS 2018 Fall Meeting, Symposium U: Monolithic and Heterogeneous Integration of Advanced Materials & Devices on SiliconPublication Fabrication, characterization and analysis of Ge/GeSn heterojunction p-type tunnel transistors
;Schulte-Braucks, Christian ;Pandey, Rahul ;Sajjad, Redwan Noor ;Barth, MikeGhosh, Ram KrishnaJournal article2017-09, IEEE Transactions on Electron Devices, (64) 10, p.4354-4362Publication Fabrication, doping and characterization of strained silicon on SiO2 by ion beam techniques
Oral presentation2008, 16th International Conference on Ion Beam Modifications of MaterialsPublication Ge epitaxial growth in view of optical device applications
Meeting abstract2016, 9th International Workshop on New Group IV Semiconductor Nanoelectronics and JSPS Core-to-Core Program Joint Seminar "Atomically, 11/01/2016Publication Ion channeling strain measurements of uniaxially strained Si/SiGe heterostructures on Si(110) and Si(110)
Meeting abstract2010, 17th International Conference on Ion Beam Modification of Materials - IBMM, 22/08/2010Publication Performance benchmarking of p-type In0.65Ga0.35As/GaAs0.4Sb0.6 and Ge/Ge0.93Sn0.07 hetero-junction tunnel FETs for low voltage logic
;Pandey, R ;Schulte-Braucks, Christian ;Sajjad, R.N. ;Barth, M. ;Ghosh, R ;Grisafe, B.Sharma, P.Proceedings paper2016-12, IEEE International Electron Devices Meeting - IEDM, 3/12/2016, p.520-523Publication Strain relaxation of SiGe/Si by He implantation: controlling dislocation sources at He precipitates
;Huging, Norbert ;Luysberg, Martina ;Urban, Knut ;Buca, Dan ;Hollander, BerndMantl, SiegfriedProceedings paper2005, Nanoelectronic Days 2005, 9/02/2005Publication Strain relaxation of SiGe/Si heterostructures by helium ionimplantation and subsequent annealing : Helium precipitates acting as dislocation sources
;Hueging, Norbert ;Luysberg, Martina ;Urban, Knut ;Buca, Dan ;Hollaender, BerndMantl, SiegfriedProceedings paper2005, Microscopy of Semiconducting Materials. Proceedings of the 14th Conference, 11/04/2005, p.97-102Publication The role of internal dislocation sources for the strain ralaxation of pseudomorphic SiGe/Si structures
;Luysberg, Martina ;Hueging, Norbert ;Lenk, Steffi ;Buca, DanHollaender, BerndOral presentation2004, MRS Spring Meeting Symposium B: High-Mobility Group-IV Materials and DevicesPublication The use of ion implantation of strained silicon on SiO2 for nanoelectronic devices
;Mantl, S. ;Buca, Dan ;Hollander, Bernd ;Trinkaus, Helmut ;Hueging, NorbertLuysberg, MartinaProceedings paper2005, MRS Fall Meeting Symposium OO: Growth, Modification, and Analysis by Ion Beams at the Nanoscale, 28/11/2005