Browsing by Author "Cartier, E."
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Publication Atomic layer deposition and remote plasma surface preparation for gate stack applications
Proceedings paper2003, Proceedings AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.12-15Publication Characterization of the Vt-instability un SiO2 HFO2 gate dielectrics
Proceedings paper2003, Proceedings 41st Annual IEEE International Reliability Physics Symposium, 30/03/2003, p.41-45Publication Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
;Young, C.D. ;Kerber, Andreas ;Hou, T.H. ;Cartier, E. ;Brown, G.A. ;Bersuker, G. ;Kim, Y.Lim, C.Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 12/10/2003Publication Charge trapping in SiO2/HfO2 dual layer gate stacks
;Cartier, E. ;Kerber, A.Pantisano, LuigiProceedings paper2004, Extended Abstracts of the 9th Workshop on Formation, Characterization and Reliability of Ultrathin Oxides, 23/01/2004, p.105-110Publication Charge trapping in SiO2/HfO2 gate dielctrics: comparison between charge-pumping and pulsed I-D-V-G
Journal article2004, Microelectronic Engineering, (72) 1_4, p.267-272Publication Issues, achievements and challenges towards intergration of high-k dielectrics
Proceedings paper2002, 5th International Forum on Semiconductor Technology - IFST, 21/02/2002Publication Mobility in high-k dielectric based field effect transistors
Proceedings paper2003, Extended Abstracts of the 2003 International Conference on Solid State Device and Materials, 16/09/2003, p.46-47Publication Performance comparison of sub 1nm sputtered TiN/HfO2 nMOS and pMOSFETs
Proceedings paper2003-12, Technical Digest IEDM - International Electron Devices Meeting, 7/12/2003, p.311-312Publication Stress induced charge trapping effects in SiO2/Al2O3 gate stacks with TiN electrodes
Journal article2003, Journal of Applied Physics, (94) 10, p.6627-6630Publication Stress polarity dependence of degradation and breakdown of SiO2/high-k stacks
Proceedings paper2003, Proceedings 41st Annual IEEE International Reliability Physics Symposium, 30/03/2003, p.23-28