Browsing by Author "Cheng, Shaunee"
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Publication 3D Contact hole metrology accuracy and stability
Publication 3D features measurement using YieldStar, an angle resolved polarized scatterometer
Proceedings paper2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.79712EPublication 3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Proceedings paper2011, Optical Fabrication, Testing and Metrology IV, 5/09/2011, p.8160QPublication 90nm technology contact CD performance characterization via ODP scatterometry
Publication A CDU comparison of double-patterning process options using Monte Carlo simulation
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741UPublication A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722EPublication A single metrology tool solution for complete exposure tool setup
; ; ; ; Publication Accurate and reliable optical CD of MuGFET down to 10nm
Proceedings paper2007, Metrology, Inspection, and Process Control for Microlithography XXI, 27/02/2007, p.65183BPublication Achieving optimum diffraction based overlay performance
Proceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382BPublication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication Advanced process control for hyper-NA lithography based on CD-SEM measurement
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.65182PPublication Analysis of the effect of point-of-use filtration on microbridging defectivity
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72730SPublication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Publication Characterisation of direct alignment for LFLE process
Proceedings paper2009, 6th Internation Symposium on Immersion Lithography Extensions, 22/10/2009Publication Characterization of integrated optical CD for process control
; Viswanathan, A.Proceedings paper2004, Metrology, Inspection, and Process Control for Microlithography XVIII, 22/02/2004, p.1059-1068Publication Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication Comparison between existing inspection techniques for EUV mask defects
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
Proceedings paper2007, Metrology, Inspection and Process Control for Microlithography XXI, 25/02/2007, p.651805Publication Critical assessment of error budget components in double patterning immersion lithography
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008