Browsing by Author "Ciesielski, Richard"
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Publication Determination of optical constants of thin films in the EUV
Journal article2022, APPLIED OPTICS, (61) 8, p.2060-2078Publication Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy
Journal article2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 041405Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963BPublication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124961MPublication Small target compatible dimensional and analytical metrology for semiconductor nanostructures using X-ray fluorescence techniques
Publication Soft X-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures
Proceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 1295507