Browsing by Author "Cuypers, Daniel"

Amorphous gadolinium aluminate as a dielectric and sulfur for indium phosphide passivation

Cleaning aspects of novel materials after CMP

Cleaning of III-V materials: surface chemistry considerations

Etching of III-V materials determined by ICP-MS with sub-nanometer precision

In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces

Interface chemistry of Al2O3/III-V upon atomic layer deposition

Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control

Nanoscale etching and reoxidation of InAs

Nanoscale etching of III-V semiconductors in acidic H2O2 solutions

Nanoscale etching of In0.53Ga0.47As for advanced CMOS processing

Sacrificial self-assembled monolayers for the passivation of GaAs (100) surfaces and interfaces

Selective wet removal of the SiN contact etch stop layer prior to S/D contact formation

Study of InP surfaces after wet chemical treatments

Study of InP surfaces after wet chemical treatments

Study of InP surfaces after wet chemical treatments

Study of the etching mechanism of heavily doped Si in HF

Study of the etching mechanisme of heavily n type doped Si in HF solutions

Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide